Proximity effect in electron beam-induced deposition

K. Mitsuishi, M. Shimojo, M. Takeguchi, M. Tanaka, K. Furuya

Research output: Contribution to journalArticle

12 Citations (Scopus)
Original languageEnglish
Pages (from-to)5517-5521
JournalJpn. J. Appl. Phys
Volume45
Publication statusPublished - 2006 Jan 1

Cite this

Mitsuishi, K., Shimojo, M., Takeguchi, M., Tanaka, M., & Furuya, K. (2006). Proximity effect in electron beam-induced deposition. Jpn. J. Appl. Phys, 45, 5517-5521.

Proximity effect in electron beam-induced deposition. / Mitsuishi, K.; Shimojo, M.; Takeguchi, M.; Tanaka, M.; Furuya, K.

In: Jpn. J. Appl. Phys, Vol. 45, 01.01.2006, p. 5517-5521.

Research output: Contribution to journalArticle

Mitsuishi, K, Shimojo, M, Takeguchi, M, Tanaka, M & Furuya, K 2006, 'Proximity effect in electron beam-induced deposition', Jpn. J. Appl. Phys, vol. 45, pp. 5517-5521.
Mitsuishi K, Shimojo M, Takeguchi M, Tanaka M, Furuya K. Proximity effect in electron beam-induced deposition. Jpn. J. Appl. Phys. 2006 Jan 1;45:5517-5521.
Mitsuishi, K. ; Shimojo, M. ; Takeguchi, M. ; Tanaka, M. ; Furuya, K. / Proximity effect in electron beam-induced deposition. In: Jpn. J. Appl. Phys. 2006 ; Vol. 45. pp. 5517-5521.
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