Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH

Hiroyuki Oguchi, Shigehito Isobe, Hiroki Kuwano, Susumu Shiraki, Shin Ichi Orimo, Taro Hitosugi

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250°C under a hydrogen pressure of 1.3 × 10-2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm.

Original languageEnglish
Article number096106
JournalAPL Materials
Volume3
Issue number9
DOIs
Publication statusPublished - 2015 Sep 1

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

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