Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing

F. Tochikubo, T. Watanabe, H. Nishikawa, E. Watanabe, D. Ito, T. Okumura, H. Kaibe

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)21-30
JournalMemoirs of Faculty of Engineering
Publication statusPublished - 1997 Jan 1

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