|Journal||Memoirs of Faculty of Engineering|
|Publication status||Published - 1997 Jan 1|
Tochikubo, F., Watanabe, T., Nishikawa, H., Watanabe, E., Ito, D., Okumura, T., & Kaibe, H. (1997). Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing. Memoirs of Faculty of Engineering, 21-30.