|Journal||Memoirs of Faculty of Engineering|
|Publication status||Published - 1997 Jan 1|
Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing. / Tochikubo, F.; Watanabe, T.; Nishikawa, H.; Watanabe, E.; Ito, D.; Okumura, T.; Kaibe, H.In: Memoirs of Faculty of Engineering, 01.01.1997, p. 21-30.
Research output: Contribution to journal › Article
TY - JOUR
T1 - Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing
AU - Tochikubo, F.
AU - Watanabe, T.
AU - Nishikawa, H.
AU - Watanabe, E.
AU - Ito, D.
AU - Okumura, T.
AU - Kaibe, H.
PY - 1997/1/1
Y1 - 1997/1/1
M3 - Article
SP - 21
EP - 30
JO - Memoirs of Faculty of Engineering
JF - Memoirs of Faculty of Engineering