| Original language | English |
|---|---|
| Pages (from-to) | 408-418 |
| Journal | Proceedings of ULSI Process Integration IV |
| Volume | 2005 |
| Publication status | Published - 2005 May 1 |
Cite this
K.Ueno, K. U., T.Ishigamil, T. I., Y.Kakuhara, Y. K., M.Kawano, M. K., & Ueno, K. (2005). Reliability of damascene copper interconnects (Invited). Proceedings of ULSI Process Integration IV, 2005, 408-418.
Reliability of damascene copper interconnects (Invited). / K.Ueno, K.Ueno; T.Ishigamil, T.Ishigamil; Y.Kakuhara, Y.Kakuhara; M.Kawano, M.Kawano; Ueno, Kazuyoshi.
In: Proceedings of ULSI Process Integration IV, Vol. 2005, 01.05.2005, p. 408-418.Research output: Contribution to journal › Article
K.Ueno, KU, T.Ishigamil, TI, Y.Kakuhara, YK, M.Kawano, MK & Ueno, K 2005, 'Reliability of damascene copper interconnects (Invited)', Proceedings of ULSI Process Integration IV, vol. 2005, pp. 408-418.
K.Ueno KU, T.Ishigamil TI, Y.Kakuhara YK, M.Kawano MK, Ueno K. Reliability of damascene copper interconnects (Invited). Proceedings of ULSI Process Integration IV. 2005 May 1;2005:408-418.
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title = "Reliability of damascene copper interconnects (Invited)",
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AU - M.Kawano, M.Kawano
AU - Ueno, Kazuyoshi
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