Reliability of damascene copper interconnects (Invited)

K.Ueno K.Ueno, T.Ishigamil T.Ishigamil, Y.Kakuhara Y.Kakuhara, M.Kawano M.Kawano, Kazuyoshi Ueno

Research output: Contribution to journalArticle

1 Citation (Scopus)
Original languageEnglish
Pages (from-to)408-418
JournalProceedings of ULSI Process Integration IV
Volume2005
Publication statusPublished - 2005 May 1

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K.Ueno, K. U., T.Ishigamil, T. I., Y.Kakuhara, Y. K., M.Kawano, M. K., & Ueno, K. (2005). Reliability of damascene copper interconnects (Invited). Proceedings of ULSI Process Integration IV, 2005, 408-418.