Research and development of non-contact spin processor for clean process in semiconductor-related-production system by applying HTS magnetic levitation

Satoshi Fukui, Kyosuke Kazama, Syouta Sekiya, Jun Ogawa, Tetsuo Oka, Takao Sato, Satoshi Sorimachi, Kimiyo Saito, Shinsuke Miyazaki

Research output: Contribution to journalArticle

3 Citations (Scopus)


Minimization of circuit patterning on wafers is required for higher integrations of circuit elements in semiconductor devices and, therefore, extremely high preciseness and quality are strictly required for patterning of microstructures on photo masks. Particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our joint R & D, application of magnetic levitation utilizing HTS bulks to the spin processors for the photo mask production has been proposed. In our previous work, a small size test spinner utilizing the magnetic levitation with the HTS bulks has been developed to investigate its applicability to the spin processors for the photo mask production. In this study, we developed a new test apparatus to investigate the improvement of the levitation and rotation ability. The levitation and rotation test by using this test apparatus showed that the levitation and the rotation ability remarkably improved. This paper describes the design and the fabrication of the test apparatus together with the levitation and rotation test results using the test apparatus.

Original languageEnglish
Article number5433322
Pages (from-to)977-980
Number of pages4
JournalIEEE Transactions on Applied Superconductivity
Issue number3
Publication statusPublished - 2010 Jun 1



  • Magnetic levitation HTS bulk
  • Spin processor

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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