Research and development of non-contact spin processor for clean process in semiconductor-related-production system by applying HTS magnetic levitation

Satoshi Fukui, Kyosuke Kazama, Syouta Sekiya, Jun Ogawa, Tetsuo Oka, Takao Sato, Satoshi Sorimachi, Kimiyo Saito, Shinsuke Miyazaki

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Minimization of circuit patterning on wafers is required for higher integrations of circuit elements in semiconductor devices and, therefore, extremely high preciseness and quality are strictly required for patterning of microstructures on photo masks. Particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our joint R & D, application of magnetic levitation utilizing HTS bulks to the spin processors for the photo mask production has been proposed. In our previous work, a small size test spinner utilizing the magnetic levitation with the HTS bulks has been developed to investigate its applicability to the spin processors for the photo mask production. In this study, we developed a new test apparatus to investigate the improvement of the levitation and rotation ability. The levitation and rotation test by using this test apparatus showed that the levitation and the rotation ability remarkably improved. This paper describes the design and the fabrication of the test apparatus together with the levitation and rotation test results using the test apparatus.

Original languageEnglish
Article number5433322
Pages (from-to)977-980
Number of pages4
JournalIEEE Transactions on Applied Superconductivity
Volume20
Issue number3
DOIs
Publication statusPublished - 2010 Jun 1
Externally publishedYes

Fingerprint

Magnetic levitation
levitation
research and development
central processing units
Masks
Semiconductor materials
masks
Bearings (structural)
Networks (circuits)
Semiconductor devices
Dust
Deterioration
spinners
Oils
Fabrication
Microstructure
semiconductor devices
deterioration
oils
dust

Keywords

  • Magnetic levitation HTS bulk
  • Spin processor

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Research and development of non-contact spin processor for clean process in semiconductor-related-production system by applying HTS magnetic levitation. / Fukui, Satoshi; Kazama, Kyosuke; Sekiya, Syouta; Ogawa, Jun; Oka, Tetsuo; Sato, Takao; Sorimachi, Satoshi; Saito, Kimiyo; Miyazaki, Shinsuke.

In: IEEE Transactions on Applied Superconductivity, Vol. 20, No. 3, 5433322, 01.06.2010, p. 977-980.

Research output: Contribution to journalArticle

Fukui, Satoshi ; Kazama, Kyosuke ; Sekiya, Syouta ; Ogawa, Jun ; Oka, Tetsuo ; Sato, Takao ; Sorimachi, Satoshi ; Saito, Kimiyo ; Miyazaki, Shinsuke. / Research and development of non-contact spin processor for clean process in semiconductor-related-production system by applying HTS magnetic levitation. In: IEEE Transactions on Applied Superconductivity. 2010 ; Vol. 20, No. 3. pp. 977-980.
@article{c11143aa096b4abeb47107b1ccbbb171,
title = "Research and development of non-contact spin processor for clean process in semiconductor-related-production system by applying HTS magnetic levitation",
abstract = "Minimization of circuit patterning on wafers is required for higher integrations of circuit elements in semiconductor devices and, therefore, extremely high preciseness and quality are strictly required for patterning of microstructures on photo masks. Particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our joint R & D, application of magnetic levitation utilizing HTS bulks to the spin processors for the photo mask production has been proposed. In our previous work, a small size test spinner utilizing the magnetic levitation with the HTS bulks has been developed to investigate its applicability to the spin processors for the photo mask production. In this study, we developed a new test apparatus to investigate the improvement of the levitation and rotation ability. The levitation and rotation test by using this test apparatus showed that the levitation and the rotation ability remarkably improved. This paper describes the design and the fabrication of the test apparatus together with the levitation and rotation test results using the test apparatus.",
keywords = "Magnetic levitation HTS bulk, Spin processor",
author = "Satoshi Fukui and Kyosuke Kazama and Syouta Sekiya and Jun Ogawa and Tetsuo Oka and Takao Sato and Satoshi Sorimachi and Kimiyo Saito and Shinsuke Miyazaki",
year = "2010",
month = "6",
day = "1",
doi = "10.1109/TASC.2010.2041766",
language = "English",
volume = "20",
pages = "977--980",
journal = "IEEE Transactions on Applied Superconductivity",
issn = "1051-8223",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "3",

}

TY - JOUR

T1 - Research and development of non-contact spin processor for clean process in semiconductor-related-production system by applying HTS magnetic levitation

AU - Fukui, Satoshi

AU - Kazama, Kyosuke

AU - Sekiya, Syouta

AU - Ogawa, Jun

AU - Oka, Tetsuo

AU - Sato, Takao

AU - Sorimachi, Satoshi

AU - Saito, Kimiyo

AU - Miyazaki, Shinsuke

PY - 2010/6/1

Y1 - 2010/6/1

N2 - Minimization of circuit patterning on wafers is required for higher integrations of circuit elements in semiconductor devices and, therefore, extremely high preciseness and quality are strictly required for patterning of microstructures on photo masks. Particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our joint R & D, application of magnetic levitation utilizing HTS bulks to the spin processors for the photo mask production has been proposed. In our previous work, a small size test spinner utilizing the magnetic levitation with the HTS bulks has been developed to investigate its applicability to the spin processors for the photo mask production. In this study, we developed a new test apparatus to investigate the improvement of the levitation and rotation ability. The levitation and rotation test by using this test apparatus showed that the levitation and the rotation ability remarkably improved. This paper describes the design and the fabrication of the test apparatus together with the levitation and rotation test results using the test apparatus.

AB - Minimization of circuit patterning on wafers is required for higher integrations of circuit elements in semiconductor devices and, therefore, extremely high preciseness and quality are strictly required for patterning of microstructures on photo masks. Particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our joint R & D, application of magnetic levitation utilizing HTS bulks to the spin processors for the photo mask production has been proposed. In our previous work, a small size test spinner utilizing the magnetic levitation with the HTS bulks has been developed to investigate its applicability to the spin processors for the photo mask production. In this study, we developed a new test apparatus to investigate the improvement of the levitation and rotation ability. The levitation and rotation test by using this test apparatus showed that the levitation and the rotation ability remarkably improved. This paper describes the design and the fabrication of the test apparatus together with the levitation and rotation test results using the test apparatus.

KW - Magnetic levitation HTS bulk

KW - Spin processor

UR - http://www.scopus.com/inward/record.url?scp=77952953101&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77952953101&partnerID=8YFLogxK

U2 - 10.1109/TASC.2010.2041766

DO - 10.1109/TASC.2010.2041766

M3 - Article

AN - SCOPUS:77952953101

VL - 20

SP - 977

EP - 980

JO - IEEE Transactions on Applied Superconductivity

JF - IEEE Transactions on Applied Superconductivity

SN - 1051-8223

IS - 3

M1 - 5433322

ER -