Resistance to active oxidation of Sol-Gel HfO2 coated SiC polycrystal

T. Akashi, M. Kasajima, Hajime Kiyono

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Sintered SiC substrate was coated with HfO2 by a sol-gel process using Hf(OEt)4, diethanol-amine, and ethanol. The HfO 2-coated SiC specimen was oxidized isothermally in high purity Ar gas flow at 1873 K for 36 ks and the weight change was monitored by an electro-microbalance. The weight of the un-coated SiC specimen decreased significantly due to the active oxidation, while the weight losses of HfO 2-coated SiC specimens after the isothermal oxidation for 36 ks were smaller than that of un-coated specimen. TEM image of HfO2-coated SiC specimen after oxidation depicted that thick SiO2 layer (∼800 nm) with a small amount of Hf elements formed on the surface of the specimen. XRD analysis indicated that HfC formed during the isothermal oxidation of HfO2-coated SiC specimen.

Original languageEnglish
Title of host publicationECS Transactions
Pages185-190
Number of pages6
Volume16
Edition44
DOIs
Publication statusPublished - 2008
Externally publishedYes
EventHigh Temperature Corrosion and Materials Chemistry 7 - 214th ECS Meeting - Honolulu, HI
Duration: 2008 Oct 122008 Oct 17

Other

OtherHigh Temperature Corrosion and Materials Chemistry 7 - 214th ECS Meeting
CityHonolulu, HI
Period08/10/1208/10/17

Fingerprint

Polycrystals
Sol-gels
Oxidation
Sol-gel process
Flow of gases
Amines
Ethanol
Transmission electron microscopy
Substrates

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Akashi, T., Kasajima, M., & Kiyono, H. (2008). Resistance to active oxidation of Sol-Gel HfO2 coated SiC polycrystal. In ECS Transactions (44 ed., Vol. 16, pp. 185-190) https://doi.org/10.1149/1.3224755

Resistance to active oxidation of Sol-Gel HfO2 coated SiC polycrystal. / Akashi, T.; Kasajima, M.; Kiyono, Hajime.

ECS Transactions. Vol. 16 44. ed. 2008. p. 185-190.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Akashi, T, Kasajima, M & Kiyono, H 2008, Resistance to active oxidation of Sol-Gel HfO2 coated SiC polycrystal. in ECS Transactions. 44 edn, vol. 16, pp. 185-190, High Temperature Corrosion and Materials Chemistry 7 - 214th ECS Meeting, Honolulu, HI, 08/10/12. https://doi.org/10.1149/1.3224755
Akashi T, Kasajima M, Kiyono H. Resistance to active oxidation of Sol-Gel HfO2 coated SiC polycrystal. In ECS Transactions. 44 ed. Vol. 16. 2008. p. 185-190 https://doi.org/10.1149/1.3224755
Akashi, T. ; Kasajima, M. ; Kiyono, Hajime. / Resistance to active oxidation of Sol-Gel HfO2 coated SiC polycrystal. ECS Transactions. Vol. 16 44. ed. 2008. pp. 185-190
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