Resolution in nanofabrication by electron-beam induced deposition combined with low energy ion milling

K. Mitsuishi, M. Shimojo, M. Tanaka, M. Takeguchi, K. Furuya

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A nanofabrication technique combining electron beam induced deposition (EBID) and low energy ion milling was demonstrated. A nanosized deposit fabricated by EBID forms a mask for successive low energy ion millings, so that the substrate region covered with the nanodeposit forms a nanostructure. Using a desired material as the substrate allows the production of any material by this method. The lateral size obtained was similar to the lateral size of the deposited mask which means that the size obtainable by the method is almost the same as the size of the deposit produced by EBID.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2004
Pages118-119
Number of pages2
Publication statusPublished - 2004 Dec 1
Event2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan
Duration: 2004 Oct 262004 Oct 29

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2004

Conference

Conference2004 International Microprocesses and Nanotechnology Conference
CountryJapan
CityOsaka
Period04/10/2604/10/29

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Mitsuishi, K., Shimojo, M., Tanaka, M., Takeguchi, M., & Furuya, K. (2004). Resolution in nanofabrication by electron-beam induced deposition combined with low energy ion milling. In Digest of Papers - Microprocesses and Nanotechnology 2004 (pp. 118-119). (Digest of Papers - Microprocesses and Nanotechnology 2004).