Resolution in new nanofabrication technique combining electron-beam-induced deposition and low-energy ion milling

Kazutaka Mitsuishi, Masayuki Shimojo, Miyoko Tanaka, Masaki Takeguchi, Kazuo Furuya

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

A new nanofabrication technique in which the deposits fabricated by electron-beam-induced deposition (EBID) are used as masks for low-energy ion milling was performed with various masks deposited at different deposition times, and the shape changes of the W mask and GaAs substrates caused by ion milling were observed. From these results, the time evolution of the shape change of the fabricated structures was studied, and the resolution dependence of the structure to the mask size was determined. The W mask showed a lower etch rate, proving its effectiveness as a mask for ion milling. Nanostructures less than 10 nm in diameter can be fabricated by this method.

Original languageEnglish
Pages (from-to)5627-5630
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume44
Issue number7 B
DOIs
Publication statusPublished - 2005 Jul 26
Externally publishedYes

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nanofabrication
Nanotechnology
Masks
Electron beams
masks
electron beams
Ions
ions
energy
Nanostructures
Deposits
deposits
Substrates

Keywords

  • Electron-beam-induced deposition
  • Ion-beam milling
  • Nanofabrication

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Resolution in new nanofabrication technique combining electron-beam-induced deposition and low-energy ion milling. / Mitsuishi, Kazutaka; Shimojo, Masayuki; Tanaka, Miyoko; Takeguchi, Masaki; Furuya, Kazuo.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 44, No. 7 B, 26.07.2005, p. 5627-5630.

Research output: Contribution to journalArticle

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