| Original language | English |
|---|---|
| Journal | Applied Physics Letters 89 |
| Publication status | Published - 2006 Nov 1 |
Cite this
K.Yamamura, K. Y., K.Kita, K. K., A.Toriumi, A. T., K.Kyuno, K. K., & Kyuno, K. (2006). Reversible creation and annihilation of a local leakage path in HfO2/GeOx stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy. Applied Physics Letters 89.
Reversible creation and annihilation of a local leakage path in HfO2/GeOx stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy. / K.Yamamura, K.Yamamura; K.Kita, K.Kita; A.Toriumi, A.Toriumi; K.Kyuno, K.Kyuno; Kyuno, Kentaro.
In: Applied Physics Letters 89, 01.11.2006.Research output: Contribution to journal › Article
K.Yamamura, KY, K.Kita, KK, A.Toriumi, AT, K.Kyuno, KK & Kyuno, K 2006, 'Reversible creation and annihilation of a local leakage path in HfO2/GeOx stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy', Applied Physics Letters 89.
K.Yamamura KY, K.Kita KK, A.Toriumi AT, K.Kyuno KK, Kyuno K. Reversible creation and annihilation of a local leakage path in HfO2/GeOx stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy. Applied Physics Letters 89. 2006 Nov 1.
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title = "Reversible creation and annihilation of a local leakage path in HfO2/GeOx stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy",
author = "K.Yamamura K.Yamamura and K.Kita K.Kita and A.Toriumi A.Toriumi and K.Kyuno K.Kyuno and Kentaro Kyuno",
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journal = "Applied Physics Letters 89",
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AU - K.Yamamura, K.Yamamura
AU - K.Kita, K.Kita
AU - A.Toriumi, A.Toriumi
AU - K.Kyuno, K.Kyuno
AU - Kyuno, Kentaro
PY - 2006/11/1
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