Reversible creation and annihilation of a local leakage path in HfO2/GeOx stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy

K.Yamamura K.Yamamura; K.Kita K.Kita; A.Toriumi A.Toriumi; K.Kyuno K.Kyuno; Kentaro Kyuno

Reversible creation and annihilation of a local leakage path in HfO2/GeOx stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy

K.Yamamura K.Yamamura, K.Kita K.Kita, A.Toriumi A.Toriumi, K.Kyuno K.Kyuno, Kentaro Kyuno

Functional Control Systems

Research output: Contribution to journal › Article › peer-review

Original language	English
Journal	Applied Physics Letters 89
Publication status	Published - 2006 Nov 1

Cite this

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title = "Reversible creation and annihilation of a local leakage path in HfO2/GeOx stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy",

author = "K.Yamamura K.Yamamura and K.Kita K.Kita and A.Toriumi A.Toriumi and K.Kyuno K.Kyuno and Kentaro Kyuno",

year = "2006",

month = nov,

day = "1",

language = "English",

journal = "Applied Physics Letters 89",

}

TY - JOUR

T1 - Reversible creation and annihilation of a local leakage path in HfO2/GeOx stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy

AU - K.Yamamura, K.Yamamura

AU - K.Kita, K.Kita

AU - A.Toriumi, A.Toriumi

AU - K.Kyuno, K.Kyuno

AU - Kyuno, Kentaro

PY - 2006/11/1

Y1 - 2006/11/1

M3 - Article

JO - Applied Physics Letters 89

JF - Applied Physics Letters 89

ER -