Self-lubrication mechanism via the in situ formed lubricious oxide tribofilm

T. Aizawa, A. Mitsuo, S. Yamamoto, T. Sumitomo, S. Muraishi

Research output: Contribution to journalArticle

80 Citations (Scopus)

Abstract

In situ formation of tribofilms is indispensable to reduce the wear volume and friction coefficient in dry. These tribofilms must be robust even in working at high normal pressure and sliding velocity between work materials and tools. Although TiN and TiC ceramic coating films are frequently utilized as a protective coating for dies and cutting tools, they often suffer from severe, adhesive wearing in dry forming and machining. Chlorine ion implantation assists lubricious oxide film to be in situ formed during wearing. At the presence of chlorine atoms in the inside of TiN or TiC films, in situ formation of lubricous intermediate titanium oxides with TiO and TinO2n-1 is sustained to preserve low frictional and wearing state. The fundamental process of this self-lubrication mechanism on the tribofilms, is discussed together with microscopic analysis and observation of worn surface and wear debris. The self-lubrication process works well in dry machining in order to reduce the flank wear of cutting tools even in the higher cutting speed range up to 500 m/min.

Original languageEnglish
Pages (from-to)708-718
Number of pages11
JournalWear
Volume259
Issue number1-6
DOIs
Publication statusPublished - 2005 Jul
Externally publishedYes

Fingerprint

self lubrication
Oxides
Lubrication
Chlorine
Wear of materials
Cutting tools
machining
chlorine
oxides
Machining
ceramic coatings
Ceramic coatings
protective coatings
Titanium oxides
Protective coatings
debris
Debris
titanium oxides
Ion implantation
coefficient of friction

Keywords

  • Chlorine implantation
  • In situ formation
  • Lubricious oxides
  • Self-lubrication mechanism
  • Titanium intermediate
  • Tribofilms

ASJC Scopus subject areas

  • Engineering(all)
  • Mechanical Engineering
  • Surfaces, Coatings and Films

Cite this

Aizawa, T., Mitsuo, A., Yamamoto, S., Sumitomo, T., & Muraishi, S. (2005). Self-lubrication mechanism via the in situ formed lubricious oxide tribofilm. Wear, 259(1-6), 708-718. https://doi.org/10.1016/j.wear.2005.02.025

Self-lubrication mechanism via the in situ formed lubricious oxide tribofilm. / Aizawa, T.; Mitsuo, A.; Yamamoto, S.; Sumitomo, T.; Muraishi, S.

In: Wear, Vol. 259, No. 1-6, 07.2005, p. 708-718.

Research output: Contribution to journalArticle

Aizawa, T, Mitsuo, A, Yamamoto, S, Sumitomo, T & Muraishi, S 2005, 'Self-lubrication mechanism via the in situ formed lubricious oxide tribofilm', Wear, vol. 259, no. 1-6, pp. 708-718. https://doi.org/10.1016/j.wear.2005.02.025
Aizawa T, Mitsuo A, Yamamoto S, Sumitomo T, Muraishi S. Self-lubrication mechanism via the in situ formed lubricious oxide tribofilm. Wear. 2005 Jul;259(1-6):708-718. https://doi.org/10.1016/j.wear.2005.02.025
Aizawa, T. ; Mitsuo, A. ; Yamamoto, S. ; Sumitomo, T. ; Muraishi, S. / Self-lubrication mechanism via the in situ formed lubricious oxide tribofilm. In: Wear. 2005 ; Vol. 259, No. 1-6. pp. 708-718.
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