Silica-based ro membranes for separation of acidic solution

Katsunori Ishii, Ayumi Ikeda, Toshichika Takeuchi, Junko Yoshiura, Mikihiro Nomura

Research output: Contribution to journalArticle

Abstract

The development of acid separation membranes is important. Silica-based reverse osmosis (RO) membranes for sulfuric acid (H2SO4) solution separation were developed by using a counter diffusion chemical vapor deposition (CVD) method. Diphenyldimethoxysilane (DPhDMOS) was used as a silica precursor. The deposited membrane showed the H2SO4 rejection of 81% with a total flux of 5.8 kg m−2 h−1 from the 10−3 mol L−1 of H2SO4. The γ-alumina substrate was damaged by the permeation of the H2SO4 solution. In order to improve acid stability, the silica substrates were developed. The acid stability was checked by the gas permeation tests after immersing in 1 mol L−1 of the H2SO4 solution for 24 h. The N2 permeance decreased by 11% with the acid treatment through the silica substrate, while the permeance decreased to 94% through the γ-alumina substrate. The flux and the rejection through the DPhDMOS-derived membrane on the silica substrate were stable in the 70 wt % H2SO4 solution.

Original languageEnglish
Article number94
JournalMembranes
Volume9
Issue number8
DOIs
Publication statusPublished - 2019 Aug 1

Fingerprint

Silicon Dioxide
Silica
Membranes
Substrates
Acids
Aluminum Oxide
Permeation
Alumina
Fluxes
Osmosis membranes
Reverse osmosis
Sulfuric acid
Chemical vapor deposition
Gases
diphenyldimethoxysilane

Keywords

  • Acid stability
  • Chemical vapor deposition
  • Counter diffusion CVD method
  • H2SO4 solution separation
  • Reverse osmosis
  • Silica membrane
  • Silica substrate
  • Sol-gel method

ASJC Scopus subject areas

  • Chemical Engineering (miscellaneous)
  • Process Chemistry and Technology
  • Filtration and Separation

Cite this

Silica-based ro membranes for separation of acidic solution. / Ishii, Katsunori; Ikeda, Ayumi; Takeuchi, Toshichika; Yoshiura, Junko; Nomura, Mikihiro.

In: Membranes, Vol. 9, No. 8, 94, 01.08.2019.

Research output: Contribution to journalArticle

Ishii, Katsunori ; Ikeda, Ayumi ; Takeuchi, Toshichika ; Yoshiura, Junko ; Nomura, Mikihiro. / Silica-based ro membranes for separation of acidic solution. In: Membranes. 2019 ; Vol. 9, No. 8.
@article{e1a2a0d2a68446b18e2313b188f5eeaa,
title = "Silica-based ro membranes for separation of acidic solution",
abstract = "The development of acid separation membranes is important. Silica-based reverse osmosis (RO) membranes for sulfuric acid (H2SO4) solution separation were developed by using a counter diffusion chemical vapor deposition (CVD) method. Diphenyldimethoxysilane (DPhDMOS) was used as a silica precursor. The deposited membrane showed the H2SO4 rejection of 81{\%} with a total flux of 5.8 kg m−2 h−1 from the 10−3 mol L−1 of H2SO4. The γ-alumina substrate was damaged by the permeation of the H2SO4 solution. In order to improve acid stability, the silica substrates were developed. The acid stability was checked by the gas permeation tests after immersing in 1 mol L−1 of the H2SO4 solution for 24 h. The N2 permeance decreased by 11{\%} with the acid treatment through the silica substrate, while the permeance decreased to 94{\%} through the γ-alumina substrate. The flux and the rejection through the DPhDMOS-derived membrane on the silica substrate were stable in the 70 wt {\%} H2SO4 solution.",
keywords = "Acid stability, Chemical vapor deposition, Counter diffusion CVD method, H2SO4 solution separation, Reverse osmosis, Silica membrane, Silica substrate, Sol-gel method",
author = "Katsunori Ishii and Ayumi Ikeda and Toshichika Takeuchi and Junko Yoshiura and Mikihiro Nomura",
year = "2019",
month = "8",
day = "1",
doi = "10.3390/membranes9080094",
language = "English",
volume = "9",
journal = "Membranes",
issn = "2077-0375",
publisher = "Molecular Diversity Preservation International",
number = "8",

}

TY - JOUR

T1 - Silica-based ro membranes for separation of acidic solution

AU - Ishii, Katsunori

AU - Ikeda, Ayumi

AU - Takeuchi, Toshichika

AU - Yoshiura, Junko

AU - Nomura, Mikihiro

PY - 2019/8/1

Y1 - 2019/8/1

N2 - The development of acid separation membranes is important. Silica-based reverse osmosis (RO) membranes for sulfuric acid (H2SO4) solution separation were developed by using a counter diffusion chemical vapor deposition (CVD) method. Diphenyldimethoxysilane (DPhDMOS) was used as a silica precursor. The deposited membrane showed the H2SO4 rejection of 81% with a total flux of 5.8 kg m−2 h−1 from the 10−3 mol L−1 of H2SO4. The γ-alumina substrate was damaged by the permeation of the H2SO4 solution. In order to improve acid stability, the silica substrates were developed. The acid stability was checked by the gas permeation tests after immersing in 1 mol L−1 of the H2SO4 solution for 24 h. The N2 permeance decreased by 11% with the acid treatment through the silica substrate, while the permeance decreased to 94% through the γ-alumina substrate. The flux and the rejection through the DPhDMOS-derived membrane on the silica substrate were stable in the 70 wt % H2SO4 solution.

AB - The development of acid separation membranes is important. Silica-based reverse osmosis (RO) membranes for sulfuric acid (H2SO4) solution separation were developed by using a counter diffusion chemical vapor deposition (CVD) method. Diphenyldimethoxysilane (DPhDMOS) was used as a silica precursor. The deposited membrane showed the H2SO4 rejection of 81% with a total flux of 5.8 kg m−2 h−1 from the 10−3 mol L−1 of H2SO4. The γ-alumina substrate was damaged by the permeation of the H2SO4 solution. In order to improve acid stability, the silica substrates were developed. The acid stability was checked by the gas permeation tests after immersing in 1 mol L−1 of the H2SO4 solution for 24 h. The N2 permeance decreased by 11% with the acid treatment through the silica substrate, while the permeance decreased to 94% through the γ-alumina substrate. The flux and the rejection through the DPhDMOS-derived membrane on the silica substrate were stable in the 70 wt % H2SO4 solution.

KW - Acid stability

KW - Chemical vapor deposition

KW - Counter diffusion CVD method

KW - H2SO4 solution separation

KW - Reverse osmosis

KW - Silica membrane

KW - Silica substrate

KW - Sol-gel method

UR - http://www.scopus.com/inward/record.url?scp=85070941704&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85070941704&partnerID=8YFLogxK

U2 - 10.3390/membranes9080094

DO - 10.3390/membranes9080094

M3 - Article

AN - SCOPUS:85070941704

VL - 9

JO - Membranes

JF - Membranes

SN - 2077-0375

IS - 8

M1 - 94

ER -