Silicon surface processing techniques for micro-systems fabrication

Vygantas Mizeikis, Saulius Juodkazis, Jia Yu Ye, Andrei Rode, Shigeki Matsuo, Hiroaki Misawa

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Micromachining of silicon surface and near-surface regions by electron-beam lithography (EBL) and reactive ion dry-etching (RIE), as well as by laser microfabrication techniques is described. Combination of EBL and RIE techniques is used to fabricate quasi two-dimensional (2D) photonic crystal (PhC) structures with aspect ratios at approximately 15. Structural and optical properties of PhC samples with 2D honeycomb lattice are reported, and a complete photonic band gap at wavelengths approximately 2.16 μm is identified from the optical transmission data. Next, laser microfabrication of silicon by femtosecond laser pulses is reported. Processing of silicon under low air pressure conditions (≃5 Torr) is demonstrated to be essentially debris-free process, highly suitable for cutting and scribing of wafers as well for hole drilling. Removal of thin films from the silicon surface by a single-shot laser ablation using mask projection is also demonstrated.

Original languageEnglish
Pages (from-to)445-451
Number of pages7
JournalThin Solid Films
Volume438-439
DOIs
Publication statusPublished - 2003 Aug 22
Externally publishedYes

Fingerprint

Silicon
Fabrication
fabrication
Dry etching
Electron beam lithography
Microfabrication
Reactive ion etching
silicon
photonics
Processing
Photonic crystals
lithography
etching
electron beams
lasers
Photonic band gap
scoring
Lasers
Micromachining
data transmission

Keywords

  • Laser ablation
  • Nanostructures
  • Optoelectronic devices
  • Silicon

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Silicon surface processing techniques for micro-systems fabrication. / Mizeikis, Vygantas; Juodkazis, Saulius; Ye, Jia Yu; Rode, Andrei; Matsuo, Shigeki; Misawa, Hiroaki.

In: Thin Solid Films, Vol. 438-439, 22.08.2003, p. 445-451.

Research output: Contribution to journalArticle

Mizeikis, V, Juodkazis, S, Ye, JY, Rode, A, Matsuo, S & Misawa, H 2003, 'Silicon surface processing techniques for micro-systems fabrication', Thin Solid Films, vol. 438-439, pp. 445-451. https://doi.org/10.1016/S0040-6090(03)00803-4
Mizeikis, Vygantas ; Juodkazis, Saulius ; Ye, Jia Yu ; Rode, Andrei ; Matsuo, Shigeki ; Misawa, Hiroaki. / Silicon surface processing techniques for micro-systems fabrication. In: Thin Solid Films. 2003 ; Vol. 438-439. pp. 445-451.
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