Abstract
Proton beam writing (PBW) was applied to the fabrication of dielectrophoretic (DEP) devices equipped with high-aspect-ratio pillar arrays. With coupled use of soft lithography for micro-fluidic channels, we successfully fabricated a device equipped with SU-8 pillar arrays produced by PBW, which is covered with a poly-dimethylsiloxane (PDMS) micro-fluidic channel. For more simplified prototyping of the device, we modified a SU-8 mold for simultaneous replication of both pillar arrays and micro-fluidic channel on PDMS. Replication of pillar arrays is limited to the aspect ratio of less than three.
Original language | English |
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Pages (from-to) | 835-838 |
Number of pages | 4 |
Journal | Microelectronic Engineering |
Volume | 87 |
Issue number | 5-8 |
DOIs | |
Publication status | Published - 2010 May |
Keywords
- Dielectrophoretic devices
- PBW
- PDMS
- SU-8
- Soft lithography
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering