Abstract
Proton beam writing (PBW) was applied to the fabrication of dielectrophoretic (DEP) devices equipped with high-aspect-ratio pillar arrays. With coupled use of soft lithography for micro-fluidic channels, we successfully fabricated a device equipped with SU-8 pillar arrays produced by PBW, which is covered with a poly-dimethylsiloxane (PDMS) micro-fluidic channel. For more simplified prototyping of the device, we modified a SU-8 mold for simultaneous replication of both pillar arrays and micro-fluidic channel on PDMS. Replication of pillar arrays is limited to the aspect ratio of less than three.
| Original language | English |
|---|---|
| Pages (from-to) | 835-838 |
| Number of pages | 4 |
| Journal | Microelectronic Engineering |
| Volume | 87 |
| Issue number | 5-8 |
| DOIs | |
| Publication status | Published - 2010 May |
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Keywords
- Dielectrophoretic devices
- PBW
- PDMS
- Soft lithography
- SU-8
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Surfaces, Coatings and Films
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
Cite this
Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing. / Shiine, Y.; Nishikawa, Hiroyuki; Furuta, Y.; Kanamitsu, K.; Satoh, T.; Ishii, Y.; Kamiya, T.; Nakao, R.; Uchida, S.
In: Microelectronic Engineering, Vol. 87, No. 5-8, 05.2010, p. 835-838.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing
AU - Shiine, Y.
AU - Nishikawa, Hiroyuki
AU - Furuta, Y.
AU - Kanamitsu, K.
AU - Satoh, T.
AU - Ishii, Y.
AU - Kamiya, T.
AU - Nakao, R.
AU - Uchida, S.
PY - 2010/5
Y1 - 2010/5
N2 - Proton beam writing (PBW) was applied to the fabrication of dielectrophoretic (DEP) devices equipped with high-aspect-ratio pillar arrays. With coupled use of soft lithography for micro-fluidic channels, we successfully fabricated a device equipped with SU-8 pillar arrays produced by PBW, which is covered with a poly-dimethylsiloxane (PDMS) micro-fluidic channel. For more simplified prototyping of the device, we modified a SU-8 mold for simultaneous replication of both pillar arrays and micro-fluidic channel on PDMS. Replication of pillar arrays is limited to the aspect ratio of less than three.
AB - Proton beam writing (PBW) was applied to the fabrication of dielectrophoretic (DEP) devices equipped with high-aspect-ratio pillar arrays. With coupled use of soft lithography for micro-fluidic channels, we successfully fabricated a device equipped with SU-8 pillar arrays produced by PBW, which is covered with a poly-dimethylsiloxane (PDMS) micro-fluidic channel. For more simplified prototyping of the device, we modified a SU-8 mold for simultaneous replication of both pillar arrays and micro-fluidic channel on PDMS. Replication of pillar arrays is limited to the aspect ratio of less than three.
KW - Dielectrophoretic devices
KW - PBW
KW - PDMS
KW - Soft lithography
KW - SU-8
UR - http://www.scopus.com/inward/record.url?scp=76949084956&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=76949084956&partnerID=8YFLogxK
U2 - 10.1016/j.mee.2009.12.071
DO - 10.1016/j.mee.2009.12.071
M3 - Article
AN - SCOPUS:76949084956
VL - 87
SP - 835
EP - 838
JO - Microelectronic Engineering
JF - Microelectronic Engineering
SN - 0167-9317
IS - 5-8
ER -