Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing

Y. Shiine; H. Nishikawa; Y. Furuta; K. Kanamitsu; T. Satoh; Y. Ishii; T. Kamiya; R. Nakao; S. Uchida

doi:10.1016/j.mee.2009.12.071

Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing

Y. Shiine, H. Nishikawa, Y. Furuta, K. Kanamitsu, T. Satoh, Y. Ishii, T. Kamiya, R. Nakao, S. Uchida

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Proton beam writing (PBW) was applied to the fabrication of dielectrophoretic (DEP) devices equipped with high-aspect-ratio pillar arrays. With coupled use of soft lithography for micro-fluidic channels, we successfully fabricated a device equipped with SU-8 pillar arrays produced by PBW, which is covered with a poly-dimethylsiloxane (PDMS) micro-fluidic channel. For more simplified prototyping of the device, we modified a SU-8 mold for simultaneous replication of both pillar arrays and micro-fluidic channel on PDMS. Replication of pillar arrays is limited to the aspect ratio of less than three.

Original language	English
Pages (from-to)	835-838
Number of pages	4
Journal	Microelectronic Engineering
Volume	87
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2009.12.071
Publication status	Published - 2010 May

Keywords

Dielectrophoretic devices
PBW
PDMS
SU-8
Soft lithography

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.mee.2009.12.071

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title = "Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing",

abstract = "Proton beam writing (PBW) was applied to the fabrication of dielectrophoretic (DEP) devices equipped with high-aspect-ratio pillar arrays. With coupled use of soft lithography for micro-fluidic channels, we successfully fabricated a device equipped with SU-8 pillar arrays produced by PBW, which is covered with a poly-dimethylsiloxane (PDMS) micro-fluidic channel. For more simplified prototyping of the device, we modified a SU-8 mold for simultaneous replication of both pillar arrays and micro-fluidic channel on PDMS. Replication of pillar arrays is limited to the aspect ratio of less than three.",

keywords = "Dielectrophoretic devices, PBW, PDMS, SU-8, Soft lithography",

author = "Y. Shiine and H. Nishikawa and Y. Furuta and K. Kanamitsu and T. Satoh and Y. Ishii and T. Kamiya and R. Nakao and S. Uchida",

note = "Funding Information: This work was supported by “Academic Frontier” Project and Grant-in-Aid for Scientific Research of the Ministry of Education, Culture, Sports, Science, and Technology, Japan.",

year = "2010",

month = may,

doi = "10.1016/j.mee.2009.12.071",

language = "English",

volume = "87",

pages = "835--838",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "5-8",

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TY - JOUR

T1 - Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing

AU - Shiine, Y.

AU - Nishikawa, H.

AU - Furuta, Y.

AU - Kanamitsu, K.

AU - Satoh, T.

AU - Ishii, Y.

AU - Kamiya, T.

AU - Nakao, R.

AU - Uchida, S.

N1 - Funding Information: This work was supported by “Academic Frontier” Project and Grant-in-Aid for Scientific Research of the Ministry of Education, Culture, Sports, Science, and Technology, Japan.

PY - 2010/5

Y1 - 2010/5

N2 - Proton beam writing (PBW) was applied to the fabrication of dielectrophoretic (DEP) devices equipped with high-aspect-ratio pillar arrays. With coupled use of soft lithography for micro-fluidic channels, we successfully fabricated a device equipped with SU-8 pillar arrays produced by PBW, which is covered with a poly-dimethylsiloxane (PDMS) micro-fluidic channel. For more simplified prototyping of the device, we modified a SU-8 mold for simultaneous replication of both pillar arrays and micro-fluidic channel on PDMS. Replication of pillar arrays is limited to the aspect ratio of less than three.

AB - Proton beam writing (PBW) was applied to the fabrication of dielectrophoretic (DEP) devices equipped with high-aspect-ratio pillar arrays. With coupled use of soft lithography for micro-fluidic channels, we successfully fabricated a device equipped with SU-8 pillar arrays produced by PBW, which is covered with a poly-dimethylsiloxane (PDMS) micro-fluidic channel. For more simplified prototyping of the device, we modified a SU-8 mold for simultaneous replication of both pillar arrays and micro-fluidic channel on PDMS. Replication of pillar arrays is limited to the aspect ratio of less than three.

KW - Dielectrophoretic devices

KW - PBW

KW - PDMS

KW - SU-8

KW - Soft lithography

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DO - 10.1016/j.mee.2009.12.071

M3 - Article

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VL - 87

SP - 835

EP - 838

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

IS - 5-8

ER -

Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing

Abstract

Keywords

ASJC Scopus subject areas

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