Abstract
Proton beam writing (PBW) was applied to the fabrication of dielectrophoretic (DEP) devices equipped with high-aspect-ratio pillar arrays. With coupled use of soft lithography for micro-fluidic channels, we successfully fabricated a device equipped with SU-8 pillar arrays produced by PBW, which is covered with a poly-dimethylsiloxane (PDMS) micro-fluidic channel. For more simplified prototyping of the device, we modified a SU-8 mold for simultaneous replication of both pillar arrays and micro-fluidic channel on PDMS. Replication of pillar arrays is limited to the aspect ratio of less than three.
| Original language | English |
|---|---|
| Pages (from-to) | 835-838 |
| Number of pages | 4 |
| Journal | Microelectronic Engineering |
| Volume | 87 |
| Issue number | 5-8 |
| DOIs | |
| Publication status | Published - 2010 May 1 |
Keywords
- Dielectrophoretic devices
- PBW
- PDMS
- SU-8
- Soft lithography
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
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Cite this
Shiine, Y., Nishikawa, H., Furuta, Y., Kanamitsu, K., Satoh, T., Ishii, Y., Kamiya, T., Nakao, R., & Uchida, S. (2010). Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing. Microelectronic Engineering, 87(5-8), 835-838. https://doi.org/10.1016/j.mee.2009.12.071