Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing

Y. Shiine, H. Nishikawa, Y. Furuta, K. Kanamitsu, T. Satoh, Y. Ishii, T. Kamiya, R. Nakao, S. Uchida

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Proton beam writing (PBW) was applied to the fabrication of dielectrophoretic (DEP) devices equipped with high-aspect-ratio pillar arrays. With coupled use of soft lithography for micro-fluidic channels, we successfully fabricated a device equipped with SU-8 pillar arrays produced by PBW, which is covered with a poly-dimethylsiloxane (PDMS) micro-fluidic channel. For more simplified prototyping of the device, we modified a SU-8 mold for simultaneous replication of both pillar arrays and micro-fluidic channel on PDMS. Replication of pillar arrays is limited to the aspect ratio of less than three.

Original languageEnglish
Pages (from-to)835-838
Number of pages4
JournalMicroelectronic Engineering
Volume87
Issue number5-8
DOIs
Publication statusPublished - 2010 May 1

Keywords

  • Dielectrophoretic devices
  • PBW
  • PDMS
  • SU-8
  • Soft lithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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