Sputter-Deposited Si layer for optical isolator with si guiding layer

Hideki Yokoi, Keigo Sasaki, Takayoshi Aiba

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

An optical isolator with a Si guiding layer that makes use of a nonreciprocal phase shift is discussed. The Si guiding layer was sputterdeposited on a garnet substrate. The magnetooptic waveguide in the optical isolator had an air/Si/magnetic garnet structure. The Si layer deposited on the garnet substrate was analyzed by spectroscopic ellipsometry and X-ray diffraction. A rib waveguide was fabricated on the deposited Si layer and evaluated. The nonreciprocal phase shift in the magnetooptic waveguide was calculated at a wavelength of 1.55 mm. The required thickness of the magnetic-garnet cladding layer was obtained by calculating the nonreciprocal phase shift.

Original languageEnglish
Article number062202
JournalJapanese Journal of Applied Physics
Volume48
Issue number6
DOIs
Publication statusPublished - 2009 Jun 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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