Sputter deposition and computational study of M-TiO₂ (M=Nb, Ta) transparent conducting oxide films

Engineering & Materials Science

• Transparent conducting oxides 100%
• Sputter deposition 89%
• Oxide films 67%
• Titanium dioxide 47%
• Sputtering 23%
• Doping (additives) 20%
• Electron mobility 14%
• Crystal growth 12%
• Refractive index 11%
• Annealing 9%
• Substitution reactions 9%
• Vacuum 8%
• Characterization (materials science) 8%
• Glass 7%
• Availability 6%
• Metals 5%

Chemical Compounds

• Sputter Deposition 78%
• Titanium Dioxide 30%
• Oxide 29%
• Liquid Film 26%
• Doping Material 16%
• Electron Mobility 10%
• Sputtering 9%
• Crystal Growth 8%
• Refractive Index 8%
• Amorphous Material 6%
• Glass 6%
• Substitution Reaction 5%
• Ambient Reaction Temperature 5%

Physics & Astronomy

• oxide films 49%
• conduction 36%
• anatase 29%
• sputtering 14%
• electrical resistivity 11%
• solar spectra 11%
• titanium oxides 9%
• electron mobility 9%
• availability 9%
• crystal growth 8%
• substitutes 7%
• refractivity 6%
• vacuum 5%
• oxides 5%
• annealing 5%
• glass 5%
• room temperature 5%
• characterization 5%