Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections

T.Homma T.Homma, Y.Kutsuzawa Y.Kutsuzawa, K.Kunimune K.Kunimune, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journalArticle

20 Citations (Scopus)
Original languageEnglish
Pages (from-to)80-85
JournalThin Solid Films
Volume235
Publication statusPublished - 1993 Nov 25

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T.Homma, T. H., Y.Kutsuzawa, Y. K., K.Kunimune, K. K., Y.Murao, Y. M., & Homma, T. (1993). Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections. Thin Solid Films, 235, 80-85.