| Original language | English |
|---|---|
| Pages (from-to) | 80-85 |
| Journal | Thin Solid Films |
| Volume | 235 |
| Publication status | Published - 1993 Nov 25 |
Cite this
T.Homma, T. H., Y.Kutsuzawa, Y. K., K.Kunimune, K. K., Y.Murao, Y. M., & Homma, T. (1993). Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections. Thin Solid Films, 235, 80-85.
Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections. / T.Homma, T.Homma; Y.Kutsuzawa, Y.Kutsuzawa; K.Kunimune, K.Kunimune; Y.Murao, Y.Murao; Homma, Tetsuya.
In: Thin Solid Films, Vol. 235, 25.11.1993, p. 80-85.Research output: Contribution to journal › Article
T.Homma, TH, Y.Kutsuzawa, YK, K.Kunimune, KK, Y.Murao, YM & Homma, T 1993, 'Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections', Thin Solid Films, vol. 235, pp. 80-85.
T.Homma TH, Y.Kutsuzawa YK, K.Kunimune KK, Y.Murao YM, Homma T. Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections. Thin Solid Films. 1993 Nov 25;235:80-85.
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title = "Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections",
author = "T.Homma T.Homma and Y.Kutsuzawa Y.Kutsuzawa and K.Kunimune K.Kunimune and Y.Murao Y.Murao and Tetsuya Homma",
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journal = "Thin Solid Films",
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AU - T.Homma, T.Homma
AU - Y.Kutsuzawa, Y.Kutsuzawa
AU - K.Kunimune, K.Kunimune
AU - Y.Murao, Y.Murao
AU - Homma, Tetsuya
PY - 1993/11/25
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JF - Thin Solid Films
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