Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections

T.Homma T.Homma, Y.Kutsuzawa Y.Kutsuzawa, K.Kunimune K.Kunimune, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journal › Article › peer-review

Cite this

@article{f940eba443d1416ca8d4779715a8bbb0,

title = "Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections",

author = "T.Homma T.Homma and Y.Kutsuzawa Y.Kutsuzawa and K.Kunimune K.Kunimune and Y.Murao Y.Murao and Tetsuya Homma",

year = "1993",

month = nov,

day = "25",

language = "English",

volume = "235",

pages = "80--85",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}

TY - JOUR

T1 - Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections

AU - T.Homma, T.Homma

AU - Y.Kutsuzawa, Y.Kutsuzawa

AU - K.Kunimune, K.Kunimune

AU - Y.Murao, Y.Murao

AU - Homma, Tetsuya

PY - 1993/11/25

Y1 - 1993/11/25

M3 - Article

VL - 235

SP - 80

EP - 85

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -