Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections

T.Homma T.Homma, Y.Kutsuzawa Y.Kutsuzawa, K.Kunimune K.Kunimune, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journalArticle

20 Citations (Scopus)
Original languageEnglish
Pages (from-to)80-85
JournalThin Solid Films
Volume235
Publication statusPublished - 1993 Nov 25

Cite this

T.Homma, T. H., Y.Kutsuzawa, Y. K., K.Kunimune, K. K., Y.Murao, Y. M., & Homma, T. (1993). Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections. Thin Solid Films, 235, 80-85.

Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections. / T.Homma, T.Homma; Y.Kutsuzawa, Y.Kutsuzawa; K.Kunimune, K.Kunimune; Y.Murao, Y.Murao; Homma, Tetsuya.

In: Thin Solid Films, Vol. 235, 25.11.1993, p. 80-85.

Research output: Contribution to journalArticle

T.Homma, TH, Y.Kutsuzawa, YK, K.Kunimune, KK, Y.Murao, YM & Homma, T 1993, 'Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections', Thin Solid Films, vol. 235, pp. 80-85.
T.Homma, T.Homma ; Y.Kutsuzawa, Y.Kutsuzawa ; K.Kunimune, K.Kunimune ; Y.Murao, Y.Murao ; Homma, Tetsuya. / Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections. In: Thin Solid Films. 1993 ; Vol. 235. pp. 80-85.
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