Original language | English |
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Pages (from-to) | 80-85 |
Journal | Thin Solid Films |
Volume | 235 |
Publication status | Published - 1993 Nov 25 |
Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections
T.Homma T.Homma, Y.Kutsuzawa Y.Kutsuzawa, K.Kunimune K.Kunimune, Y.Murao Y.Murao, Tetsuya Homma
Research output: Contribution to journal › Article › peer-review
20
Citations
(Scopus)