Stable Observation of the Evolution of Leakage Spots in HfO2/SiO2 stacked structures

K. Kyuno, K. Kita, A. Toriumi

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)788-789
JournalExtended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)
Publication statusPublished - 2004 Sep 1

Cite this

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title = "Stable Observation of the Evolution of Leakage Spots in HfO2/SiO2 stacked structures",
author = "K. Kyuno and K. Kita and A. Toriumi",
year = "2004",
month = "9",
day = "1",
language = "English",
pages = "788--789",
journal = "Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)",

}

TY - JOUR

T1 - Stable Observation of the Evolution of Leakage Spots in HfO2/SiO2 stacked structures

AU - Kyuno, K.

AU - Kita, K.

AU - Toriumi, A.

PY - 2004/9/1

Y1 - 2004/9/1

M3 - Article

SP - 788

EP - 789

JO - Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)

JF - Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)

ER -