Stable silica membranes prepared by using a counter diffusion chemical vapor deposition for high temperature hydrogen separation

Mikihiro Nomura, Surag Gopalakrishnan, Hitoshi Aida, Takashi Sugawara, Shin-ichi Nakao

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)101-104
JournalDefault journal
Publication statusPublished - 2005 Oct 10

Cite this

Stable silica membranes prepared by using a counter diffusion chemical vapor deposition for high temperature hydrogen separation. / Nomura, Mikihiro; Gopalakrishnan, Surag; Aida, Hitoshi; Sugawara, Takashi; Nakao, Shin-ichi.

In: Default journal, 10.10.2005, p. 101-104.

Research output: Contribution to journalArticle

Nomura, Mikihiro ; Gopalakrishnan, Surag ; Aida, Hitoshi ; Sugawara, Takashi ; Nakao, Shin-ichi. / Stable silica membranes prepared by using a counter diffusion chemical vapor deposition for high temperature hydrogen separation. In: Default journal. 2005 ; pp. 101-104.
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AU - Nakao, Shin-ichi

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