Stable silica membranes prepared by using a counter diffusion chemical vapor deposition for high temperature hydrogen separation

Mikihiro Nomura, Surag Gopalakrishnan, Hitoshi Aida, Takashi Sugawara, Shin-ichi Nakao

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)101-104
JournalDefault journal
Publication statusPublished - 2005 Oct 10

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