Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition

Mikihiro Nomura, Hitoshi Aida, Suraj Gopalakarishnan, TakashiSugawara TakashiSugawara, Shin-ichi Nakao, Satoshi Yamazaki, Takeshi Inada, Yuji Iwamoto

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)1-7
JournalDesalination
Volume193
Publication statusPublished - 2006 May 10

Cite this

Nomura, M., Aida, H., Gopalakarishnan, S., TakashiSugawara, T., Nakao, S., Yamazaki, S., ... Iwamoto, Y. (2006). Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition. Desalination, 193, 1-7.

Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition. / Nomura, Mikihiro; Aida, Hitoshi; Gopalakarishnan, Suraj; TakashiSugawara, TakashiSugawara; Nakao, Shin-ichi; Yamazaki, Satoshi; Inada, Takeshi; Iwamoto, Yuji.

In: Desalination, Vol. 193, 10.05.2006, p. 1-7.

Research output: Contribution to journalArticle

Nomura, M, Aida, H, Gopalakarishnan, S, TakashiSugawara, T, Nakao, S, Yamazaki, S, Inada, T & Iwamoto, Y 2006, 'Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition', Desalination, vol. 193, pp. 1-7.
Nomura M, Aida H, Gopalakarishnan S, TakashiSugawara T, Nakao S, Yamazaki S et al. Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition. Desalination. 2006 May 10;193:1-7.
Nomura, Mikihiro ; Aida, Hitoshi ; Gopalakarishnan, Suraj ; TakashiSugawara, TakashiSugawara ; Nakao, Shin-ichi ; Yamazaki, Satoshi ; Inada, Takeshi ; Iwamoto, Yuji. / Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition. In: Desalination. 2006 ; Vol. 193. pp. 1-7.
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AU - Nakao, Shin-ichi

AU - Yamazaki, Satoshi

AU - Inada, Takeshi

AU - Iwamoto, Yuji

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