Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition

Mikihiro Nomura, Hitoshi Aida, Suraj Gopalakarishnan, TakashiSugawara TakashiSugawara, Shin-ichi Nakao, Satoshi Yamazaki, Takeshi Inada, Yuji Iwamoto

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)1-7
JournalDesalination
Volume193
Publication statusPublished - 2006 May 10

Cite this

Nomura, M., Aida, H., Gopalakarishnan, S., TakashiSugawara, T., Nakao, S., Yamazaki, S., Inada, T., & Iwamoto, Y. (2006). Steam stability of a silica membrane prepared by a counter diffusion chemical vapor deposition. Desalination, 193, 1-7.