Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition

Mikihiro Nomura, Hitoshi Aida, Suraj Gopalakrishnan, Takashi Sugawara, Shin ichi Nakao, Satoshi Yamazaki, Takeshi Inada, Yuji Iwamoto

Research output: Contribution to journalArticle

44 Citations (Scopus)

Abstract

A silica membrane having an excellent H2/N2 permeance ratio (over 800) was prepared by the counter-diffusion chemical vapor deposition method. The H2/N2 permeance ratio was kept for 82 h under 76 kPa of steam at 773 K. The H2/H2O permeance ratio through the silica membrane was ca. 300 at 773 K. This is much higher than that through silica membranes prepared by a sol-gel method. The deposited silica layer was found in the γ-alumina layer of the substrate by TEM observations, indicating that the silica deposition is controlled by counter-diffusion of the precursors. Steam stability tests for porous γ-alumina substrates are also discussed. Pore size of the γ-alumina layer increased with an increasing steam treatment period at 773 K. The pore size of the γ-alumina layer was ca. 9 nm after 52 h of steam treatment.

Original languageEnglish
Pages (from-to)1-7
Number of pages7
JournalDesalination
Volume193
Issue number1-3
DOIs
Publication statusPublished - 2006 May 10
Externally publishedYes

Fingerprint

Steam
Silicon Dioxide
Aluminum Oxide
Chemical vapor deposition
silica
aluminum oxide
Silica
membrane
Membranes
Alumina
Pore size
substrate
Substrates
Sol-gel process
transmission electron microscopy
gel
chemical
Transmission electron microscopy
method

Keywords

  • Alumina substrate
  • Counter-diffusion CVD
  • Silica membrane
  • TEM observation

ASJC Scopus subject areas

  • Filtration and Separation

Cite this

Nomura, M., Aida, H., Gopalakrishnan, S., Sugawara, T., Nakao, S. I., Yamazaki, S., ... Iwamoto, Y. (2006). Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition. Desalination, 193(1-3), 1-7. https://doi.org/10.1016/j.desal.2005.08.019

Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition. / Nomura, Mikihiro; Aida, Hitoshi; Gopalakrishnan, Suraj; Sugawara, Takashi; Nakao, Shin ichi; Yamazaki, Satoshi; Inada, Takeshi; Iwamoto, Yuji.

In: Desalination, Vol. 193, No. 1-3, 10.05.2006, p. 1-7.

Research output: Contribution to journalArticle

Nomura, M, Aida, H, Gopalakrishnan, S, Sugawara, T, Nakao, SI, Yamazaki, S, Inada, T & Iwamoto, Y 2006, 'Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition', Desalination, vol. 193, no. 1-3, pp. 1-7. https://doi.org/10.1016/j.desal.2005.08.019
Nomura, Mikihiro ; Aida, Hitoshi ; Gopalakrishnan, Suraj ; Sugawara, Takashi ; Nakao, Shin ichi ; Yamazaki, Satoshi ; Inada, Takeshi ; Iwamoto, Yuji. / Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition. In: Desalination. 2006 ; Vol. 193, No. 1-3. pp. 1-7.
@article{8f50f82aab23420c991b1bf723957332,
title = "Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition",
abstract = "A silica membrane having an excellent H2/N2 permeance ratio (over 800) was prepared by the counter-diffusion chemical vapor deposition method. The H2/N2 permeance ratio was kept for 82 h under 76 kPa of steam at 773 K. The H2/H2O permeance ratio through the silica membrane was ca. 300 at 773 K. This is much higher than that through silica membranes prepared by a sol-gel method. The deposited silica layer was found in the γ-alumina layer of the substrate by TEM observations, indicating that the silica deposition is controlled by counter-diffusion of the precursors. Steam stability tests for porous γ-alumina substrates are also discussed. Pore size of the γ-alumina layer increased with an increasing steam treatment period at 773 K. The pore size of the γ-alumina layer was ca. 9 nm after 52 h of steam treatment.",
keywords = "Alumina substrate, Counter-diffusion CVD, Silica membrane, TEM observation",
author = "Mikihiro Nomura and Hitoshi Aida and Suraj Gopalakrishnan and Takashi Sugawara and Nakao, {Shin ichi} and Satoshi Yamazaki and Takeshi Inada and Yuji Iwamoto",
year = "2006",
month = "5",
day = "10",
doi = "10.1016/j.desal.2005.08.019",
language = "English",
volume = "193",
pages = "1--7",
journal = "Desalination",
issn = "0011-9164",
publisher = "Elsevier",
number = "1-3",

}

TY - JOUR

T1 - Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition

AU - Nomura, Mikihiro

AU - Aida, Hitoshi

AU - Gopalakrishnan, Suraj

AU - Sugawara, Takashi

AU - Nakao, Shin ichi

AU - Yamazaki, Satoshi

AU - Inada, Takeshi

AU - Iwamoto, Yuji

PY - 2006/5/10

Y1 - 2006/5/10

N2 - A silica membrane having an excellent H2/N2 permeance ratio (over 800) was prepared by the counter-diffusion chemical vapor deposition method. The H2/N2 permeance ratio was kept for 82 h under 76 kPa of steam at 773 K. The H2/H2O permeance ratio through the silica membrane was ca. 300 at 773 K. This is much higher than that through silica membranes prepared by a sol-gel method. The deposited silica layer was found in the γ-alumina layer of the substrate by TEM observations, indicating that the silica deposition is controlled by counter-diffusion of the precursors. Steam stability tests for porous γ-alumina substrates are also discussed. Pore size of the γ-alumina layer increased with an increasing steam treatment period at 773 K. The pore size of the γ-alumina layer was ca. 9 nm after 52 h of steam treatment.

AB - A silica membrane having an excellent H2/N2 permeance ratio (over 800) was prepared by the counter-diffusion chemical vapor deposition method. The H2/N2 permeance ratio was kept for 82 h under 76 kPa of steam at 773 K. The H2/H2O permeance ratio through the silica membrane was ca. 300 at 773 K. This is much higher than that through silica membranes prepared by a sol-gel method. The deposited silica layer was found in the γ-alumina layer of the substrate by TEM observations, indicating that the silica deposition is controlled by counter-diffusion of the precursors. Steam stability tests for porous γ-alumina substrates are also discussed. Pore size of the γ-alumina layer increased with an increasing steam treatment period at 773 K. The pore size of the γ-alumina layer was ca. 9 nm after 52 h of steam treatment.

KW - Alumina substrate

KW - Counter-diffusion CVD

KW - Silica membrane

KW - TEM observation

UR - http://www.scopus.com/inward/record.url?scp=33746545697&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33746545697&partnerID=8YFLogxK

U2 - 10.1016/j.desal.2005.08.019

DO - 10.1016/j.desal.2005.08.019

M3 - Article

VL - 193

SP - 1

EP - 7

JO - Desalination

JF - Desalination

SN - 0011-9164

IS - 1-3

ER -