Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition

Mikihiro Nomura, Hitoshi Aida, Suraj Gopalakrishnan, Takashi Sugawara, Shin ichi Nakao, Satoshi Yamazaki, Takeshi Inada, Yuji Iwamoto

Research output: Contribution to journalArticle

45 Citations (Scopus)

Abstract

A silica membrane having an excellent H2/N2 permeance ratio (over 800) was prepared by the counter-diffusion chemical vapor deposition method. The H2/N2 permeance ratio was kept for 82 h under 76 kPa of steam at 773 K. The H2/H2O permeance ratio through the silica membrane was ca. 300 at 773 K. This is much higher than that through silica membranes prepared by a sol-gel method. The deposited silica layer was found in the γ-alumina layer of the substrate by TEM observations, indicating that the silica deposition is controlled by counter-diffusion of the precursors. Steam stability tests for porous γ-alumina substrates are also discussed. Pore size of the γ-alumina layer increased with an increasing steam treatment period at 773 K. The pore size of the γ-alumina layer was ca. 9 nm after 52 h of steam treatment.

Original languageEnglish
Pages (from-to)1-7
Number of pages7
JournalDesalination
Volume193
Issue number1-3
DOIs
Publication statusPublished - 2006 May 10

    Fingerprint

Keywords

  • Alumina substrate
  • Counter-diffusion CVD
  • Silica membrane
  • TEM observation

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Science(all)
  • Water Science and Technology
  • Mechanical Engineering

Cite this

Nomura, M., Aida, H., Gopalakrishnan, S., Sugawara, T., Nakao, S. I., Yamazaki, S., Inada, T., & Iwamoto, Y. (2006). Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition. Desalination, 193(1-3), 1-7. https://doi.org/10.1016/j.desal.2005.08.019