Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition

Mikihiro Nomura; Hitoshi Aida; Suraj Gopalakrishnan; Takashi Sugawara; Shin ichi Nakao; Satoshi Yamazaki; Takeshi Inada; Yuji Iwamoto

doi:10.1016/j.desal.2005.08.019

Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition

Mikihiro Nomura, Hitoshi Aida, Suraj Gopalakrishnan, Takashi Sugawara, Shin ichi Nakao, Satoshi Yamazaki, Takeshi Inada, Yuji Iwamoto

Research output: Contribution to journal › Article › peer-review

49 Citations (Scopus)

Abstract

A silica membrane having an excellent H₂/N₂ permeance ratio (over 800) was prepared by the counter-diffusion chemical vapor deposition method. The H₂/N₂ permeance ratio was kept for 82 h under 76 kPa of steam at 773 K. The H₂/H₂O permeance ratio through the silica membrane was ca. 300 at 773 K. This is much higher than that through silica membranes prepared by a sol-gel method. The deposited silica layer was found in the γ-alumina layer of the substrate by TEM observations, indicating that the silica deposition is controlled by counter-diffusion of the precursors. Steam stability tests for porous γ-alumina substrates are also discussed. Pore size of the γ-alumina layer increased with an increasing steam treatment period at 773 K. The pore size of the γ-alumina layer was ca. 9 nm after 52 h of steam treatment.

Original language	English
Pages (from-to)	1-7
Number of pages	7
Journal	Desalination
Volume	193
Issue number	1-3
DOIs	https://doi.org/10.1016/j.desal.2005.08.019
Publication status	Published - 2006 May 10
Externally published	Yes

Keywords

Alumina substrate
Counter-diffusion CVD
Silica membrane
TEM observation

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)
Materials Science(all)
Water Science and Technology
Mechanical Engineering

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10.1016/j.desal.2005.08.019

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title = "Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition",

abstract = "A silica membrane having an excellent H2/N2 permeance ratio (over 800) was prepared by the counter-diffusion chemical vapor deposition method. The H2/N2 permeance ratio was kept for 82 h under 76 kPa of steam at 773 K. The H2/H2O permeance ratio through the silica membrane was ca. 300 at 773 K. This is much higher than that through silica membranes prepared by a sol-gel method. The deposited silica layer was found in the γ-alumina layer of the substrate by TEM observations, indicating that the silica deposition is controlled by counter-diffusion of the precursors. Steam stability tests for porous γ-alumina substrates are also discussed. Pore size of the γ-alumina layer increased with an increasing steam treatment period at 773 K. The pore size of the γ-alumina layer was ca. 9 nm after 52 h of steam treatment.",

keywords = "Alumina substrate, Counter-diffusion CVD, Silica membrane, TEM observation",

author = "Mikihiro Nomura and Hitoshi Aida and Suraj Gopalakrishnan and Takashi Sugawara and Nakao, {Shin ichi} and Satoshi Yamazaki and Takeshi Inada and Yuji Iwamoto",

note = "Funding Information: The authors thank Dr. Balagopal N. Nair of Noritake Co. for fruitful discussions on a sol-gel method to prepare γ-alumina layers. This work was supported by NEDO as a part of the R&D Project on Highly Efficient Ceramic Membranes for High-Temperature Separation of Hydrogen, promoted by METI, Japan.",

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AU - Nomura, Mikihiro

AU - Aida, Hitoshi

AU - Gopalakrishnan, Suraj

AU - Sugawara, Takashi

AU - Nakao, Shin ichi

AU - Yamazaki, Satoshi

AU - Inada, Takeshi

AU - Iwamoto, Yuji

N1 - Funding Information: The authors thank Dr. Balagopal N. Nair of Noritake Co. for fruitful discussions on a sol-gel method to prepare γ-alumina layers. This work was supported by NEDO as a part of the R&D Project on Highly Efficient Ceramic Membranes for High-Temperature Separation of Hydrogen, promoted by METI, Japan.

PY - 2006/5/10

Y1 - 2006/5/10

N2 - A silica membrane having an excellent H2/N2 permeance ratio (over 800) was prepared by the counter-diffusion chemical vapor deposition method. The H2/N2 permeance ratio was kept for 82 h under 76 kPa of steam at 773 K. The H2/H2O permeance ratio through the silica membrane was ca. 300 at 773 K. This is much higher than that through silica membranes prepared by a sol-gel method. The deposited silica layer was found in the γ-alumina layer of the substrate by TEM observations, indicating that the silica deposition is controlled by counter-diffusion of the precursors. Steam stability tests for porous γ-alumina substrates are also discussed. Pore size of the γ-alumina layer increased with an increasing steam treatment period at 773 K. The pore size of the γ-alumina layer was ca. 9 nm after 52 h of steam treatment.

AB - A silica membrane having an excellent H2/N2 permeance ratio (over 800) was prepared by the counter-diffusion chemical vapor deposition method. The H2/N2 permeance ratio was kept for 82 h under 76 kPa of steam at 773 K. The H2/H2O permeance ratio through the silica membrane was ca. 300 at 773 K. This is much higher than that through silica membranes prepared by a sol-gel method. The deposited silica layer was found in the γ-alumina layer of the substrate by TEM observations, indicating that the silica deposition is controlled by counter-diffusion of the precursors. Steam stability tests for porous γ-alumina substrates are also discussed. Pore size of the γ-alumina layer increased with an increasing steam treatment period at 773 K. The pore size of the γ-alumina layer was ca. 9 nm after 52 h of steam treatment.

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KW - TEM observation

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Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition

Abstract

Keywords

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