Structural and compositional characterization of N 2 -H 2 plasma surface-treated TiO 2 thin films

L. Miao, S. Tanemura, H. Watanabe, S. Toh, K. Kaneko

Research output: Contribution to journalConference article

12 Citations (Scopus)

Abstract

The structural and compositional properties of three samples such as as-deposited single-phase anatase-TiO 2 polycrystalline thin films on slide glass substrates (No. 1), the sample surface-treated by N 2 -H 2 mixed-gases plasma (No. 2), and the sample being additionally anneal-treated in N 2 gases (No. 3), are characterized by transmission electron microscopy (TEM) and energy dispersive X-ray spectroscopy (EDS). The primitive lattice cells of three thin films are verified as distorted in comparison with that of bulk from the TEM results. This distortion of primitive lattice cell causes the increase of optical band gap for the films when we compared it with that of bulk, while the decrease of optical band gap should be attributed to the substitution of N into TiO 2 . Higher concentration of nitrogen in sample No. 3 is confirmed by line-EDS profiles under scanning TEM (STEM) when compared with sample No. 2 and this confirms that plasma surface treatment is an effective way for N-doping in TiO 2 .

Original languageEnglish
Pages (from-to)412-417
Number of pages6
JournalApplied Surface Science
Volume244
Issue number1-4
DOIs
Publication statusPublished - 2005 May 15
Externally publishedYes
Event12th International Conference on Solid Films and Surfaces - Hammatsu, Japan
Duration: 2004 Jun 212004 Jun 25

Keywords

  • Chemical composition
  • Optical band gap
  • Plasma-treated
  • TEM
  • Thin films
  • Titanium dioxide

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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