Structural and compositional characterization of N                         2                         -H                          2                          plasma surface-treated TiO                         2                          thin films

L. Miao; S. Tanemura; H. Watanabe; S. Toh; K. Kaneko

doi:10.1016/j.apsusc.2004.10.098

Structural and compositional characterization of N ₂ -H ₂ plasma surface-treated TiO ₂ thin films

L. Miao, S. Tanemura, H. Watanabe, S. Toh, K. Kaneko

Research output: Contribution to journal › Conference article › peer-review

13 Citations (Scopus)

Abstract

The structural and compositional properties of three samples such as as-deposited single-phase anatase-TiO ₂ polycrystalline thin films on slide glass substrates (No. 1), the sample surface-treated by N ₂ -H ₂ mixed-gases plasma (No. 2), and the sample being additionally anneal-treated in N ₂ gases (No. 3), are characterized by transmission electron microscopy (TEM) and energy dispersive X-ray spectroscopy (EDS). The primitive lattice cells of three thin films are verified as distorted in comparison with that of bulk from the TEM results. This distortion of primitive lattice cell causes the increase of optical band gap for the films when we compared it with that of bulk, while the decrease of optical band gap should be attributed to the substitution of N into TiO ₂ . Higher concentration of nitrogen in sample No. 3 is confirmed by line-EDS profiles under scanning TEM (STEM) when compared with sample No. 2 and this confirms that plasma surface treatment is an effective way for N-doping in TiO ₂ .

Original language	English
Pages (from-to)	412-417
Number of pages	6
Journal	Applied Surface Science
Volume	244
Issue number	1-4
DOIs	https://doi.org/10.1016/j.apsusc.2004.10.098
Publication status	Published - 2005 May 15
Externally published	Yes
Event	12th International Conference on Solid Films and Surfaces - Hammatsu, Japan Duration: 2004 Jun 21 → 2004 Jun 25

Keywords

Chemical composition
Optical band gap
Plasma-treated
TEM
Thin films
Titanium dioxide

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1016/j.apsusc.2004.10.098

Cite this

Miao, L., Tanemura, S., Watanabe, H., Toh, S., & Kaneko, K. (2005). Structural and compositional characterization of N ₂ -H ₂ plasma surface-treated TiO ₂ thin films Applied Surface Science, 244(1-4), 412-417. https://doi.org/10.1016/j.apsusc.2004.10.098

Structural and compositional characterization of N ₂ -H ₂ plasma surface-treated TiO ₂ thin films . / Miao, L.; Tanemura, S.; Watanabe, H. et al.

In: Applied Surface Science, Vol. 244, No. 1-4, 15.05.2005, p. 412-417.

Research output: Contribution to journal › Conference article › peer-review

Miao, L, Tanemura, S, Watanabe, H, Toh, S & Kaneko, K 2005, ' Structural and compositional characterization of N ₂ -H ₂ plasma surface-treated TiO ₂ thin films ', Applied Surface Science, vol. 244, no. 1-4, pp. 412-417. https://doi.org/10.1016/j.apsusc.2004.10.098

Miao L, Tanemura S, Watanabe H, Toh S, Kaneko K. Structural and compositional characterization of N ₂ -H ₂ plasma surface-treated TiO ₂ thin films Applied Surface Science. 2005 May 15;244(1-4):412-417. doi: 10.1016/j.apsusc.2004.10.098

Miao, L. ; Tanemura, S. ; Watanabe, H. et al. / Structural and compositional characterization of N ₂ -H ₂ plasma surface-treated TiO ₂ thin films In: Applied Surface Science. 2005 ; Vol. 244, No. 1-4. pp. 412-417.

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title = " Structural and compositional characterization of N 2 -H 2 plasma surface-treated TiO 2 thin films ",

abstract = " The structural and compositional properties of three samples such as as-deposited single-phase anatase-TiO 2 polycrystalline thin films on slide glass substrates (No. 1), the sample surface-treated by N 2 -H 2 mixed-gases plasma (No. 2), and the sample being additionally anneal-treated in N 2 gases (No. 3), are characterized by transmission electron microscopy (TEM) and energy dispersive X-ray spectroscopy (EDS). The primitive lattice cells of three thin films are verified as distorted in comparison with that of bulk from the TEM results. This distortion of primitive lattice cell causes the increase of optical band gap for the films when we compared it with that of bulk, while the decrease of optical band gap should be attributed to the substitution of N into TiO 2 . Higher concentration of nitrogen in sample No. 3 is confirmed by line-EDS profiles under scanning TEM (STEM) when compared with sample No. 2 and this confirms that plasma surface treatment is an effective way for N-doping in TiO 2 .",

keywords = "Chemical composition, Optical band gap, Plasma-treated, TEM, Thin films, Titanium dioxide",

author = "L. Miao and S. Tanemura and H. Watanabe and S. Toh and K. Kaneko",

note = "Funding Information: This work is partly supported by grants from the NITECH 21st Century COE program for “World Ceramics Center for Environmental Harmony”. A part of this work is supported by “Nanotechnology Support Project” of the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan. ; 12th International Conference on Solid Films and Surfaces ; Conference date: 21-06-2004 Through 25-06-2004",

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AU - Kaneko, K.

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N2 - The structural and compositional properties of three samples such as as-deposited single-phase anatase-TiO 2 polycrystalline thin films on slide glass substrates (No. 1), the sample surface-treated by N 2 -H 2 mixed-gases plasma (No. 2), and the sample being additionally anneal-treated in N 2 gases (No. 3), are characterized by transmission electron microscopy (TEM) and energy dispersive X-ray spectroscopy (EDS). The primitive lattice cells of three thin films are verified as distorted in comparison with that of bulk from the TEM results. This distortion of primitive lattice cell causes the increase of optical band gap for the films when we compared it with that of bulk, while the decrease of optical band gap should be attributed to the substitution of N into TiO 2 . Higher concentration of nitrogen in sample No. 3 is confirmed by line-EDS profiles under scanning TEM (STEM) when compared with sample No. 2 and this confirms that plasma surface treatment is an effective way for N-doping in TiO 2 .

AB - The structural and compositional properties of three samples such as as-deposited single-phase anatase-TiO 2 polycrystalline thin films on slide glass substrates (No. 1), the sample surface-treated by N 2 -H 2 mixed-gases plasma (No. 2), and the sample being additionally anneal-treated in N 2 gases (No. 3), are characterized by transmission electron microscopy (TEM) and energy dispersive X-ray spectroscopy (EDS). The primitive lattice cells of three thin films are verified as distorted in comparison with that of bulk from the TEM results. This distortion of primitive lattice cell causes the increase of optical band gap for the films when we compared it with that of bulk, while the decrease of optical band gap should be attributed to the substitution of N into TiO 2 . Higher concentration of nitrogen in sample No. 3 is confirmed by line-EDS profiles under scanning TEM (STEM) when compared with sample No. 2 and this confirms that plasma surface treatment is an effective way for N-doping in TiO 2 .

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