Structural and electrical properties of HfLaOx films for an amorphous high-k gate insulator

Y. Yamamoto; K. Kita; K. Kyuno; A. Toriumi

doi:10.1063/1.2227630

Structural and electrical properties of HfLaO_x films for an amorphous high-k gate insulator

Y. Yamamoto, K. Kita, K. Kyuno, A. Toriumi

Research output: Contribution to journal › Article › peer-review

142 Citations (Scopus)

Abstract

Thin HfLaO_x films on Si(100) have been investigated as an alternative gate insulator. The introduction of La₂O₃ into HfO₂ causes an increase of crystallization temperature. Furthermore, unlike other Hf-based amorphous materials such as HfSiO_x or HfAlO_x, the permittivity of HfLaO_x keeps a high value (>20). The capacitance-voltage curve of metal oxide semiconductor capacitor using the HfLaO_x dielectric film has shown a negligible hysteresis and no frequency dispersion, indicating very small degradations of both interface and bulk properties. In addition, a very low fixed charge density in HfLaO_x films is demonstrated from a very small film thickness dependence of the flatband voltage.

Original language	English
Article number	032903
Journal	Applied Physics Letters
Volume	89
Issue number	3
DOIs	https://doi.org/10.1063/1.2227630
Publication status	Published - 2006 Jul 28
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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abstract = "Thin HfLaOx films on Si(100) have been investigated as an alternative gate insulator. The introduction of La2O3 into HfO2 causes an increase of crystallization temperature. Furthermore, unlike other Hf-based amorphous materials such as HfSiOx or HfAlOx, the permittivity of HfLaOx keeps a high value (>20). The capacitance-voltage curve of metal oxide semiconductor capacitor using the HfLaOx dielectric film has shown a negligible hysteresis and no frequency dispersion, indicating very small degradations of both interface and bulk properties. In addition, a very low fixed charge density in HfLaOx films is demonstrated from a very small film thickness dependence of the flatband voltage.",

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AU - Yamamoto, Y.

AU - Kita, K.

AU - Kyuno, K.

AU - Toriumi, A.

PY - 2006/7/28

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AB - Thin HfLaOx films on Si(100) have been investigated as an alternative gate insulator. The introduction of La2O3 into HfO2 causes an increase of crystallization temperature. Furthermore, unlike other Hf-based amorphous materials such as HfSiOx or HfAlOx, the permittivity of HfLaOx keeps a high value (>20). The capacitance-voltage curve of metal oxide semiconductor capacitor using the HfLaOx dielectric film has shown a negligible hysteresis and no frequency dispersion, indicating very small degradations of both interface and bulk properties. In addition, a very low fixed charge density in HfLaOx films is demonstrated from a very small film thickness dependence of the flatband voltage.

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