Structural characteristics of Mg-Ni alloy films prepared by ion beam sputtering

A. Mitsuo, T. Aizawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

The effect of magnesium concentration on the crystal structure of Mg-Ni alloy films was investigated. Mg-Ni alloy films were prepared by means of the ion beam sputtering. Incident ions were argon ions generated by the electron cyclotron resonance (ECR) source. Various concentration ratio of Mg to Ni in film were obtained by using different target area ratio of Mg to Ni. The Mg-Ni alloy films were characterized by EDX, XRD and TEM. The films contained from 30 to 60 mol% Mg were recognized as an amorphous-like structure by XRD. Their composition are corresponding to the intermetallic compounds in Mg-Ni binary system. Cross-sectional TEM observation showed that the film deposited on silicon wafer substrates had two deferent regions of crystal structures. One is the columnar structure near the substrate and another is the equiaxed-crystalline with fine grain. It was confirmed that the composition and crystal structure of Mg-Ni alloy film could be controlled by the target area ratio of Mg to Ni.

Original languageEnglish
Title of host publicationProcessing and Fabrication of Advanced Materials X
EditorsT.S. Srivatsan, R.A. Varin, T.S. Srivatsan, R.A. Varin
Pages121-127
Number of pages7
Publication statusPublished - 2001
Externally publishedYes
EventProcessing and Fabrication of Advanced Materials X - Indianapolis, IN
Duration: 2001 Nov 52001 Nov 8

Other

OtherProcessing and Fabrication of Advanced Materials X
CityIndianapolis, IN
Period01/11/501/11/8

Fingerprint

Ion beams
Sputtering
Crystal structure
Transmission electron microscopy
Electron cyclotron resonance
Ions
Substrates
Chemical analysis
Silicon wafers
Intermetallics
Magnesium
Argon
Energy dispersive spectroscopy
Crystalline materials

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Mitsuo, A., & Aizawa, T. (2001). Structural characteristics of Mg-Ni alloy films prepared by ion beam sputtering. In T. S. Srivatsan, R. A. Varin, T. S. Srivatsan, & R. A. Varin (Eds.), Processing and Fabrication of Advanced Materials X (pp. 121-127)

Structural characteristics of Mg-Ni alloy films prepared by ion beam sputtering. / Mitsuo, A.; Aizawa, T.

Processing and Fabrication of Advanced Materials X. ed. / T.S. Srivatsan; R.A. Varin; T.S. Srivatsan; R.A. Varin. 2001. p. 121-127.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Mitsuo, A & Aizawa, T 2001, Structural characteristics of Mg-Ni alloy films prepared by ion beam sputtering. in TS Srivatsan, RA Varin, TS Srivatsan & RA Varin (eds), Processing and Fabrication of Advanced Materials X. pp. 121-127, Processing and Fabrication of Advanced Materials X, Indianapolis, IN, 01/11/5.
Mitsuo A, Aizawa T. Structural characteristics of Mg-Ni alloy films prepared by ion beam sputtering. In Srivatsan TS, Varin RA, Srivatsan TS, Varin RA, editors, Processing and Fabrication of Advanced Materials X. 2001. p. 121-127
Mitsuo, A. ; Aizawa, T. / Structural characteristics of Mg-Ni alloy films prepared by ion beam sputtering. Processing and Fabrication of Advanced Materials X. editor / T.S. Srivatsan ; R.A. Varin ; T.S. Srivatsan ; R.A. Varin. 2001. pp. 121-127
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