Structure and electrical properties of HfLaOx films for an amorphous high-k gate insulator

Y.Yamamoto Y.Yamamoto, K.Kita K.Kita, K.Kyuno K.Kyuno, A.Toriumi A.Toriumi, Kentaro Kyuno

Research output: Contribution to journalArticle

Original languageEnglish
JournalApplied Physics Letters
Volume89
Publication statusPublished - 2006 Apr 1

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