Structure and electrical properties of HfLaOx films for an amorphous high-k gate insulator

Y.Yamamoto Y.Yamamoto, K.Kita K.Kita, K.Kyuno K.Kyuno, A.Toriumi A.Toriumi, Kentaro Kyuno

Research output: Contribution to journalArticle

Original languageEnglish
JournalApplied Physics Letters
Volume89
Publication statusPublished - 2006 Apr 1

Cite this

Structure and electrical properties of HfLaOx films for an amorphous high-k gate insulator. / Y.Yamamoto, Y.Yamamoto; K.Kita, K.Kita; K.Kyuno, K.Kyuno; A.Toriumi, A.Toriumi; Kyuno, Kentaro.

In: Applied Physics Letters, Vol. 89, 01.04.2006.

Research output: Contribution to journalArticle

Y.Yamamoto, Y.Yamamoto ; K.Kita, K.Kita ; K.Kyuno, K.Kyuno ; A.Toriumi, A.Toriumi ; Kyuno, Kentaro. / Structure and electrical properties of HfLaOx films for an amorphous high-k gate insulator. In: Applied Physics Letters. 2006 ; Vol. 89.
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