Study of La-induced flat band voltage shift in Metal/HfLaOx/SiO2/Si capacitors

Y.Yamamoto Y.Yamamoto, K.Kita K.Kita, K.Kyuno K.Kyuno, A.Toriumi A.Toriumi, Kentaro Kyuno

Research output: Contribution to journalArticle

Original languageEnglish
JournalJapanese Journal of Applied Physics Letters 46
Publication statusPublished - 2007 Nov 1

Cite this

Study of La-induced flat band voltage shift in Metal/HfLaOx/SiO2/Si capacitors. / Y.Yamamoto, Y.Yamamoto; K.Kita, K.Kita; K.Kyuno, K.Kyuno; A.Toriumi, A.Toriumi; Kyuno, Kentaro.

In: Japanese Journal of Applied Physics Letters 46, 01.11.2007.

Research output: Contribution to journalArticle

Y.Yamamoto, Y.Yamamoto ; K.Kita, K.Kita ; K.Kyuno, K.Kyuno ; A.Toriumi, A.Toriumi ; Kyuno, Kentaro. / Study of La-induced flat band voltage shift in Metal/HfLaOx/SiO2/Si capacitors. In: Japanese Journal of Applied Physics Letters 46. 2007.
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