Study on the growth mechanism of pentacene thin films by the analysis of island density and island size distribution

M. Tejima, K. Kita, Kentaro Kyuno, A. Toriumi

Research output: Contribution to journalArticle

29 Citations (Scopus)

Abstract

The growth mechanism of pentacene thin films on a thermally grown SiO 2 on Si(100) substrate is examined in detail for a wide substrate temperature range (223-342 K) by analyzing the saturated island density and island size distribution. It is found that the log plot of the saturated island density as a function of inverse substrate temperature can be well represented by two straight lines and that these two regions have different critical cluster sizes for nucleation which is independently confirmed by island size distribution analysis. It is concluded that the nucleation behavior of pentacene thin films can be explained by the diffusion-mediated growth model well known in inorganic thin-film growth.

Original languageEnglish
Pages (from-to)3746-3748
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number17
DOIs
Publication statusPublished - 2004 Oct 25
Externally publishedYes

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thin films
nucleation
plots
temperature

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Study on the growth mechanism of pentacene thin films by the analysis of island density and island size distribution. / Tejima, M.; Kita, K.; Kyuno, Kentaro; Toriumi, A.

In: Applied Physics Letters, Vol. 85, No. 17, 25.10.2004, p. 3746-3748.

Research output: Contribution to journalArticle

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