Suppression of electromigration early failure of Cu/Porous low-k interconnects using dummy metal

Yumi Kakuhara, Shinji Yokogawa, Masayuki Hiroi, Toshiyuki Takewaki, Kazuyoshi Ueno

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

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Physics & Astronomy

Engineering & Materials Science