Suppression of leakage current and moisture absorption of la 2O3 films with ultraviolet ozone post treatment

Yi Zhao; Koji Kita; Kentaro Kyuno; Akira Toriumi

doi:10.1143/JJAP.46.4189

Suppression of leakage current and moisture absorption of la ₂O₃ films with ultraviolet ozone post treatment

Yi Zhao, Koji Kita, Kentaro Kyuno, Akira Toriumi

Research output: Contribution to journal › Article › peer-review

37 Citations (Scopus)

Abstract

In this study, ultraviolet (UV) ozone post treatment is proposed as an effective method of suppressing gate leakage current associated with the moisture absorption of lanthanum oxide (La₂O₃) films. It is considered that suppression effects come from the healing of oxygen vacancies in the film by the UV ozone post treatment, since the oxygen ambient annealing also shows similar suppression effects. As compared with the oxygen ambient annealing, however, the UV ozone treatment does not enhance the interface layer thickness between the La₂O₃ and Si substrates, whereas the oxygen ambient annealing does. Therefore, the UV ozone post treatment is an effective method of suppressing the moisture absorption of La₂O ₃ films.

Original language	English
Pages (from-to)	4189-4192
Number of pages	4
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	46
Issue number	7 A
DOIs	https://doi.org/10.1143/JJAP.46.4189
Publication status	Published - 2007 Jul 4
Externally published	Yes

Keywords

Gate dielectric
Lanthanum oxide
Leakage current
Moisture absorption
Ultraviolet ozone treatment

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.1143/JJAP.46.4189

Cite this

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title = "Suppression of leakage current and moisture absorption of la 2O3 films with ultraviolet ozone post treatment",

abstract = "In this study, ultraviolet (UV) ozone post treatment is proposed as an effective method of suppressing gate leakage current associated with the moisture absorption of lanthanum oxide (La2O3) films. It is considered that suppression effects come from the healing of oxygen vacancies in the film by the UV ozone post treatment, since the oxygen ambient annealing also shows similar suppression effects. As compared with the oxygen ambient annealing, however, the UV ozone treatment does not enhance the interface layer thickness between the La2O3 and Si substrates, whereas the oxygen ambient annealing does. Therefore, the UV ozone post treatment is an effective method of suppressing the moisture absorption of La2O 3 films.",

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AU - Zhao, Yi

AU - Kita, Koji

AU - Kyuno, Kentaro

AU - Toriumi, Akira

PY - 2007/7/4

Y1 - 2007/7/4

N2 - In this study, ultraviolet (UV) ozone post treatment is proposed as an effective method of suppressing gate leakage current associated with the moisture absorption of lanthanum oxide (La2O3) films. It is considered that suppression effects come from the healing of oxygen vacancies in the film by the UV ozone post treatment, since the oxygen ambient annealing also shows similar suppression effects. As compared with the oxygen ambient annealing, however, the UV ozone treatment does not enhance the interface layer thickness between the La2O3 and Si substrates, whereas the oxygen ambient annealing does. Therefore, the UV ozone post treatment is an effective method of suppressing the moisture absorption of La2O 3 films.

AB - In this study, ultraviolet (UV) ozone post treatment is proposed as an effective method of suppressing gate leakage current associated with the moisture absorption of lanthanum oxide (La2O3) films. It is considered that suppression effects come from the healing of oxygen vacancies in the film by the UV ozone post treatment, since the oxygen ambient annealing also shows similar suppression effects. As compared with the oxygen ambient annealing, however, the UV ozone treatment does not enhance the interface layer thickness between the La2O3 and Si substrates, whereas the oxygen ambient annealing does. Therefore, the UV ozone post treatment is an effective method of suppressing the moisture absorption of La2O 3 films.

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KW - Leakage current

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KW - Ultraviolet ozone treatment

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