Surface amorphization in Zr alloy films via Ni implantation

Shinji Muraishi; Hirono Naito; Tatuhiko Aizawa

Surface amorphization in Zr alloy films via Ni implantation

Shinji Muraishi, Hirono Naito, Tatuhiko Aizawa

Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

Ni-implantation has been conducted for sputter-deposited Zr and Zr-Cu films to investigate surface amorphization behavior in proportion to Ni by transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The film of Zr and Zr-Cu with the thickness of 200 nm has been prepared on (001) Si substrate with the certain area fraction of target materials. As deposited films show columnar hcp-Zr and nano-crystalline hcp-Zr(Cu). Ni-implantation induced surface amorphization of Zr and Zr-Cu with thickness of ∼100nm in depth. The critical concentration for amorphization via Ni implantation is calculated to be 20at%Ni for Zr, 6at%Ni for Zr-Cu film. The lower Ni concentration for amorphization of Zr-Cu might be attributed to the chemical interaction of Ni with Zr and Cu according to the negative heat of mixing.

Original language	English
Title of host publication	Surfaces and Interfaces in Nanostructured Materials II - Proceedings of Symposium sponsored by the Surface Engineering Committee of the Materials Processing and Manufacturing Division(MPMD)of The Mine
Pages	23-27
Number of pages	5
Publication status	Published - 2006 Dec 1
Event	135th TMS Annual Meeting, 2006 - San Antonio, TX, United States Duration: 2006 Mar 12 → 2006 Mar 16

Publication series

Name	TMS Annual Meeting
Volume	2006

Conference

Conference	135th TMS Annual Meeting, 2006
Country/Territory	United States
City	San Antonio, TX
Period	06/3/12 → 06/3/16

Keywords

Ion implantation
Metallic glass
Solid-state amorphization
Zr-Cu film

ASJC Scopus subject areas

Condensed Matter Physics
Mechanics of Materials
Metals and Alloys

Cite this

Surface amorphization in Zr alloy films via Ni implantation. / Muraishi, Shinji; Naito, Hirono; Aizawa, Tatuhiko.

Surfaces and Interfaces in Nanostructured Materials II - Proceedings of Symposium sponsored by the Surface Engineering Committee of the Materials Processing and Manufacturing Division(MPMD)of The Mine. 2006. p. 23-27 (TMS Annual Meeting; Vol. 2006).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Muraishi, S, Naito, H & Aizawa, T 2006, Surface amorphization in Zr alloy films via Ni implantation. in Surfaces and Interfaces in Nanostructured Materials II - Proceedings of Symposium sponsored by the Surface Engineering Committee of the Materials Processing and Manufacturing Division(MPMD)of The Mine. TMS Annual Meeting, vol. 2006, pp. 23-27, 135th TMS Annual Meeting, 2006, San Antonio, TX, United States, 06/3/12.

@inproceedings{b45c6528b32c4a02a60242ca16c7aa13,

title = "Surface amorphization in Zr alloy films via Ni implantation",

abstract = "Ni-implantation has been conducted for sputter-deposited Zr and Zr-Cu films to investigate surface amorphization behavior in proportion to Ni by transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The film of Zr and Zr-Cu with the thickness of 200 nm has been prepared on (001) Si substrate with the certain area fraction of target materials. As deposited films show columnar hcp-Zr and nano-crystalline hcp-Zr(Cu). Ni-implantation induced surface amorphization of Zr and Zr-Cu with thickness of ∼100nm in depth. The critical concentration for amorphization via Ni implantation is calculated to be 20at%Ni for Zr, 6at%Ni for Zr-Cu film. The lower Ni concentration for amorphization of Zr-Cu might be attributed to the chemical interaction of Ni with Zr and Cu according to the negative heat of mixing.",

keywords = "Ion implantation, Metallic glass, Solid-state amorphization, Zr-Cu film",

author = "Shinji Muraishi and Hirono Naito and Tatuhiko Aizawa",

year = "2006",

month = dec,

day = "1",

language = "English",

isbn = "087339626X",

series = "TMS Annual Meeting",

pages = "23--27",

booktitle = "Surfaces and Interfaces in Nanostructured Materials II - Proceedings of Symposium sponsored by the Surface Engineering Committee of the Materials Processing and Manufacturing Division(MPMD)of The Mine",

note = "135th TMS Annual Meeting, 2006 ; Conference date: 12-03-2006 Through 16-03-2006",

}

TY - GEN

T1 - Surface amorphization in Zr alloy films via Ni implantation

AU - Muraishi, Shinji

AU - Naito, Hirono

AU - Aizawa, Tatuhiko

PY - 2006/12/1

Y1 - 2006/12/1

N2 - Ni-implantation has been conducted for sputter-deposited Zr and Zr-Cu films to investigate surface amorphization behavior in proportion to Ni by transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The film of Zr and Zr-Cu with the thickness of 200 nm has been prepared on (001) Si substrate with the certain area fraction of target materials. As deposited films show columnar hcp-Zr and nano-crystalline hcp-Zr(Cu). Ni-implantation induced surface amorphization of Zr and Zr-Cu with thickness of ∼100nm in depth. The critical concentration for amorphization via Ni implantation is calculated to be 20at%Ni for Zr, 6at%Ni for Zr-Cu film. The lower Ni concentration for amorphization of Zr-Cu might be attributed to the chemical interaction of Ni with Zr and Cu according to the negative heat of mixing.

AB - Ni-implantation has been conducted for sputter-deposited Zr and Zr-Cu films to investigate surface amorphization behavior in proportion to Ni by transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The film of Zr and Zr-Cu with the thickness of 200 nm has been prepared on (001) Si substrate with the certain area fraction of target materials. As deposited films show columnar hcp-Zr and nano-crystalline hcp-Zr(Cu). Ni-implantation induced surface amorphization of Zr and Zr-Cu with thickness of ∼100nm in depth. The critical concentration for amorphization via Ni implantation is calculated to be 20at%Ni for Zr, 6at%Ni for Zr-Cu film. The lower Ni concentration for amorphization of Zr-Cu might be attributed to the chemical interaction of Ni with Zr and Cu according to the negative heat of mixing.

KW - Ion implantation

KW - Metallic glass

KW - Solid-state amorphization

KW - Zr-Cu film

UR - http://www.scopus.com/inward/record.url?scp=33845936363&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33845936363&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:33845936363

SN - 087339626X

SN - 9780873396264

T3 - TMS Annual Meeting

SP - 23

EP - 27

BT - Surfaces and Interfaces in Nanostructured Materials II - Proceedings of Symposium sponsored by the Surface Engineering Committee of the Materials Processing and Manufacturing Division(MPMD)of The Mine

T2 - 135th TMS Annual Meeting, 2006

Y2 - 12 March 2006 through 16 March 2006

ER -

Surface amorphization in Zr alloy films via Ni implantation

Abstract

Publication series

Conference

Keywords

ASJC Scopus subject areas

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