Surface modification of spin-on-glass film by liquid-phase deposition of fluorinated silicon oxide

Engineering & Materials Science

• Acids 10%
• Adsorption 11%
• Argon 13%
• Carbon 8%
• Electrons 11%
• Etching 12%
• Fabrication 8%
• Fluorine 15%
• Fourier transforms 11%
• Glass 54%
• Infrared radiation 9%
• Ions 10%
• Liquids 46%
• Optical properties 14%
• Optical waveguides 17%
• Oxide films 14%
• Oxygen 9%
• Refractive index 15%
• Silicon 9%
• Silicon oxides 100%
• Surface treatment 72%
• Thin films 10%
• Wavelength 10%

Physics & Astronomy

• acids 10%
• adsorption 8%
• aqueous solutions 10%
• argon 8%
• carbon 7%
• electrons 4%
• etching 8%
• fabrication 6%
• fluorine 11%
• glass 40%
• infrared spectra 10%
• ions 5%
• liquid phases 58%
• optical properties 7%
• optical waveguides 11%
• oxide films 10%
• oxygen 6%
• reflectance 8%
• refractivity 8%
• silicon 6%
• silicon oxides 72%
• thin films 5%
• wavelengths 5%

Chemical Compounds

• Acid 3%
• Adsorption 4%
• Aqueous Solution 5%
• Auger Electron Spectrum 14%
• Carbon Atom 4%
• Dioxygen 4%
• Etching 8%
• Fluorine Atom 8%
• Fourier Transform Infrared Spectrum 10%
• Ion 3%
• Liquid Film 33%
• Optical Property 7%
• Refractive Index 9%
• Silicon Oxide 85%
• Surface 9%
• Surface Modification 59%
• Wavelength 7%