Surface modifications of aromatic polyimides by RF-oxygen plasma and pulsed electrical discharges in water

Camelia Miron, I. Sava, M. Aflori, L. Ursu, I. Jepu, C. Porosnicu, C. P. Lungu, L. Sacarescu, V. Harabagiu

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Aromatic polyimide films were subjected to RF-oxygen plasma and pulsed electrical discharges in distilled water treatment for 2, 4, and 6 minutes. The film surface was investigated by means of Fourier Transform Infrared Spectroscopy, Atomic Force Microscopy, and contact angle measurements. It was observed that the polymer film surface became more hydrophilic after the RF-oxygen plasma exposure due to the formation of the oxygen-containing polar groups, while the sample surface became more hydrophobic after the water plasma treatment due to the surface segregation of the CF3 groups.

Original languageEnglish
Pages (from-to)1206-1211
Number of pages6
JournalJournal of Optoelectronics and Advanced Materials
Volume16
Issue number9-10
Publication statusPublished - 2014 Jan 1
Externally publishedYes

Fingerprint

oxygen plasma
polyimides
Polyimides
Surface treatment
Oxygen
Plasmas
Water
water
Surface segregation
Angle measurement
Water treatment
Polymer films
Contact angle
Fourier transform infrared spectroscopy
water treatment
Atomic force microscopy
infrared spectroscopy
atomic force microscopy
polymers
oxygen

Keywords

  • Aromatic polyimides
  • RF-oxygen plasma
  • Surface modifications
  • Water plasma

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Miron, C., Sava, I., Aflori, M., Ursu, L., Jepu, I., Porosnicu, C., ... Harabagiu, V. (2014). Surface modifications of aromatic polyimides by RF-oxygen plasma and pulsed electrical discharges in water. Journal of Optoelectronics and Advanced Materials, 16(9-10), 1206-1211.

Surface modifications of aromatic polyimides by RF-oxygen plasma and pulsed electrical discharges in water. / Miron, Camelia; Sava, I.; Aflori, M.; Ursu, L.; Jepu, I.; Porosnicu, C.; Lungu, C. P.; Sacarescu, L.; Harabagiu, V.

In: Journal of Optoelectronics and Advanced Materials, Vol. 16, No. 9-10, 01.01.2014, p. 1206-1211.

Research output: Contribution to journalArticle

Miron, C, Sava, I, Aflori, M, Ursu, L, Jepu, I, Porosnicu, C, Lungu, CP, Sacarescu, L & Harabagiu, V 2014, 'Surface modifications of aromatic polyimides by RF-oxygen plasma and pulsed electrical discharges in water', Journal of Optoelectronics and Advanced Materials, vol. 16, no. 9-10, pp. 1206-1211.
Miron, Camelia ; Sava, I. ; Aflori, M. ; Ursu, L. ; Jepu, I. ; Porosnicu, C. ; Lungu, C. P. ; Sacarescu, L. ; Harabagiu, V. / Surface modifications of aromatic polyimides by RF-oxygen plasma and pulsed electrical discharges in water. In: Journal of Optoelectronics and Advanced Materials. 2014 ; Vol. 16, No. 9-10. pp. 1206-1211.
@article{58003322e6804e879d9c712bc1a05785,
title = "Surface modifications of aromatic polyimides by RF-oxygen plasma and pulsed electrical discharges in water",
abstract = "Aromatic polyimide films were subjected to RF-oxygen plasma and pulsed electrical discharges in distilled water treatment for 2, 4, and 6 minutes. The film surface was investigated by means of Fourier Transform Infrared Spectroscopy, Atomic Force Microscopy, and contact angle measurements. It was observed that the polymer film surface became more hydrophilic after the RF-oxygen plasma exposure due to the formation of the oxygen-containing polar groups, while the sample surface became more hydrophobic after the water plasma treatment due to the surface segregation of the CF3 groups.",
keywords = "Aromatic polyimides, RF-oxygen plasma, Surface modifications, Water plasma",
author = "Camelia Miron and I. Sava and M. Aflori and L. Ursu and I. Jepu and C. Porosnicu and Lungu, {C. P.} and L. Sacarescu and V. Harabagiu",
year = "2014",
month = "1",
day = "1",
language = "English",
volume = "16",
pages = "1206--1211",
journal = "Journal of Optoelectronics and Advanced Materials",
issn = "1454-4164",
publisher = "National Institute of Optoelectronics",
number = "9-10",

}

TY - JOUR

T1 - Surface modifications of aromatic polyimides by RF-oxygen plasma and pulsed electrical discharges in water

AU - Miron, Camelia

AU - Sava, I.

AU - Aflori, M.

AU - Ursu, L.

AU - Jepu, I.

AU - Porosnicu, C.

AU - Lungu, C. P.

AU - Sacarescu, L.

AU - Harabagiu, V.

PY - 2014/1/1

Y1 - 2014/1/1

N2 - Aromatic polyimide films were subjected to RF-oxygen plasma and pulsed electrical discharges in distilled water treatment for 2, 4, and 6 minutes. The film surface was investigated by means of Fourier Transform Infrared Spectroscopy, Atomic Force Microscopy, and contact angle measurements. It was observed that the polymer film surface became more hydrophilic after the RF-oxygen plasma exposure due to the formation of the oxygen-containing polar groups, while the sample surface became more hydrophobic after the water plasma treatment due to the surface segregation of the CF3 groups.

AB - Aromatic polyimide films were subjected to RF-oxygen plasma and pulsed electrical discharges in distilled water treatment for 2, 4, and 6 minutes. The film surface was investigated by means of Fourier Transform Infrared Spectroscopy, Atomic Force Microscopy, and contact angle measurements. It was observed that the polymer film surface became more hydrophilic after the RF-oxygen plasma exposure due to the formation of the oxygen-containing polar groups, while the sample surface became more hydrophobic after the water plasma treatment due to the surface segregation of the CF3 groups.

KW - Aromatic polyimides

KW - RF-oxygen plasma

KW - Surface modifications

KW - Water plasma

UR - http://www.scopus.com/inward/record.url?scp=84914125116&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84914125116&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:84914125116

VL - 16

SP - 1206

EP - 1211

JO - Journal of Optoelectronics and Advanced Materials

JF - Journal of Optoelectronics and Advanced Materials

SN - 1454-4164

IS - 9-10

ER -