Surface passivation effects on AlGaN/GaN high-electron-mobility transistors with SiO2, Si3N4, and silicon oxynitride

S. Arulkumaran, T. Egawa, H. Ishikawa, T. Jimbo, Y. Sano

Research output: Contribution to journalArticlepeer-review

177 Citations (Scopus)


The effects of surface passivation on AlGaN/GaN high-electron-mobility transistors (HEMT) were analyzed. An increase in maximum drain current (I Dmax) and extrinsic transductance(gmmax) was observed on comparing the passivated (SiO2, Si3N4 and silicon oxynitride) HEMT with the unpassivated HEMT. A small increase in I gLeak was also observed on silicon oxynitride passivated HEMT. Result show that high breakdown voltage (BVgd) on SiO2 passivated HEMT were due to the formation of deep traps.

Original languageEnglish
Pages (from-to)613-615
Number of pages3
JournalApplied Physics Letters
Issue number4
Publication statusPublished - 2004 Jan 26
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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