Abstract
A new process using a Co-N catalyst has been developed to perform doping simultaneously with film formation in solid phase deposition method (SPD) which does not require transfer of multilayer graphene (MLG). Nitrogen doping into MLG was confirmed by XPS and UPS and succeeded in reducing sheet resistance by about 36%.
| Original language | English |
|---|---|
| Title of host publication | 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 354-356 |
| Number of pages | 3 |
| ISBN (Electronic) | 9781538665084 |
| DOIs | |
| Publication status | Published - 2019 Mar 1 |
| Event | 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 - Singapore, Singapore Duration: 2019 Mar 12 → 2019 Mar 15 |
Publication series
| Name | 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 |
|---|
Conference
| Conference | 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 |
|---|---|
| Country | Singapore |
| City | Singapore |
| Period | 19/3/12 → 19/3/15 |
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Keywords
- doping
- multilayer graphene
- solid-phase deosition
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Instrumentation
- Hardware and Architecture
Cite this
Synthesis of nitrogen-doped multilayer graphene film by solid-phase deposition using Co-N catalyst. / Fujishima, Yuki; Ueno, Kazuyoshi.
2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019. Institute of Electrical and Electronics Engineers Inc., 2019. p. 354-356 8731097 (2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Synthesis of nitrogen-doped multilayer graphene film by solid-phase deposition using Co-N catalyst
AU - Fujishima, Yuki
AU - Ueno, Kazuyoshi
PY - 2019/3/1
Y1 - 2019/3/1
N2 - A new process using a Co-N catalyst has been developed to perform doping simultaneously with film formation in solid phase deposition method (SPD) which does not require transfer of multilayer graphene (MLG). Nitrogen doping into MLG was confirmed by XPS and UPS and succeeded in reducing sheet resistance by about 36%.
AB - A new process using a Co-N catalyst has been developed to perform doping simultaneously with film formation in solid phase deposition method (SPD) which does not require transfer of multilayer graphene (MLG). Nitrogen doping into MLG was confirmed by XPS and UPS and succeeded in reducing sheet resistance by about 36%.
KW - doping
KW - multilayer graphene
KW - solid-phase deosition
UR - http://www.scopus.com/inward/record.url?scp=85067783107&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85067783107&partnerID=8YFLogxK
U2 - 10.1109/EDTM.2019.8731097
DO - 10.1109/EDTM.2019.8731097
M3 - Conference contribution
T3 - 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
SP - 354
EP - 356
BT - 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
PB - Institute of Electrical and Electronics Engineers Inc.
ER -