A LCLC series-parallel high-frequency ac/ac resonant inverter configure for ion assistant vacuum-sputtering manufacture film is proposed. The characteristic of the sputtering chamber and a simplified steady-state analysis of the inverter, using complex circuit analysis, are presented. The control implementation circuit block diagram is introduced to the resonant inverter, which can implement the output current regulation and variable frequency operation simultaneity; the system stability benefits from this control method. It is suitable for the characteristic of chamber load, and the switching losses to be lower as much as possible in such large dynamic load. The 15 kW-30A prototype power supply is described, and experimental results are given.