The effect of oxygen in Ru gate electrode on effective work function of Ru/HfO2 stack structure

T.Nabatame T.Nabatame, K.Segawa K.Segawa, M.Kadoshima M.Kadoshima, H.Tanabe H.Tanabe, K.Iwamoto K.Iwamoto, S.Kimura S.Kimura, Y.Nunoshige Y.Nunoshige, H.Satake H.Satake, A.Toriumi A.Toriumi, T. Ohishi, Tomoji Oishi

Research output: Contribution to journalArticle

12 Citations (Scopus)
Original languageEnglish
Journal2006 European Materials Research Society Spring Meeting (Nice,France)
Publication statusPublished - 2006 Jun 10

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T.Nabatame, T. N., K.Segawa, K. S., M.Kadoshima, M. K., H.Tanabe, H. T., K.Iwamoto, K. I., S.Kimura, S. K., Y.Nunoshige, Y. N., H.Satake, H. S., A.Toriumi, A. T., Ohishi, T., & Oishi, T. (2006). The effect of oxygen in Ru gate electrode on effective work function of Ru/HfO2 stack structure. 2006 European Materials Research Society Spring Meeting (Nice,France).