Original language | English |
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Pages (from-to) | 401 |
Journal | Default journal |
Publication status | Published - 2004 Jun 1 |
The effect of the accelerating voltage in the size of deposit in electron-beam-induced deposition
K. Mitsuishi, Z. Q. Liu, M. Shimojo, M. Tanaka., K. Furuya
Research output: Contribution to journal › Article › peer-review