The effect of the accelerating voltage in the size of deposit in electron-beam-induced deposition

K. Mitsuishi, Z. Q. Liu, M. Shimojo, M. Tanaka., K. Furuya

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)401
JournalDefault journal
Publication statusPublished - 2004 Jun 1

Cite this

The effect of the accelerating voltage in the size of deposit in electron-beam-induced deposition. / Mitsuishi, K.; Liu, Z. Q.; Shimojo, M.; Tanaka., M.; Furuya, K.

In: Default journal, 01.06.2004, p. 401.

Research output: Contribution to journalArticle

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