The Growth of Silicon Single Crystal by the Magnetic Field Applied Continuous CZ (CMCZ) Method.

Yoshiaki Arai, Michio Kida, Naoki Ono, Keisei Abe, Norihisa Machida, Hisashi Furuya, Kensho Sahira

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	669-669
Journal	The Electrochemical Society
Publication status	Published - 1994 May 1

Cite this

@article{a767c89ecd244b1bb325b35e276e3f2a,

title = "The Growth of Silicon Single Crystal by the Magnetic Field Applied Continuous CZ (CMCZ) Method.",

author = "Yoshiaki Arai and Michio Kida and Naoki Ono and Keisei Abe and Norihisa Machida and Hisashi Furuya and Kensho Sahira",

year = "1994",

month = may,

day = "1",

language = "English",

pages = "669--669",

journal = "The Electrochemical Society",

}

TY - JOUR

T1 - The Growth of Silicon Single Crystal by the Magnetic Field Applied Continuous CZ (CMCZ) Method.

AU - Arai, Yoshiaki

AU - Kida, Michio

AU - Ono, Naoki

AU - Abe, Keisei

AU - Machida, Norihisa

AU - Furuya, Hisashi

AU - Sahira, Kensho

PY - 1994/5/1

Y1 - 1994/5/1

M3 - Article

SP - 669

EP - 669

JO - The Electrochemical Society

JF - The Electrochemical Society

ER -