Abstract
The influence of Ta underlayers on the structures of TiO 2 thin films grown onto unheated glass substrates by radio frequency magnetron sputtering has been studied and compared. The crystal, electronic, and surface structures of fabricated TiO 2 films were investigated by X-ray diffraction, X-ray photoelectron spectroscopy, and atomic force microscopy, respectively. The X-ray diffraction results and valence band spectra by X-ray photoelectron spectroscopy revealed that the fabricated TiO 2 films on the unheated glass substrate with a highly crystallized β-Ta underlayer showed an anatase structure, whereas the TiO 2 film grown directly onto glass or onto a poorly crystallized Ta film showed an amorphous one. The results showed that the crystallized anatase TiO 2 films were successfully obtained on glass substrates using the Ta underlayers without substrate heating and additional annealing.
Original language | English |
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Pages (from-to) | 8764-8768 |
Number of pages | 5 |
Journal | Applied Surface Science |
Volume | 258 |
Issue number | 22 |
DOIs | |
Publication status | Published - 2012 Sep 1 |
Keywords
- Crystallization
- Sputtering processes
- Tantalum
- Thin film structure
- Titanium dioxides
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films