The microscopic mechanism of surfactant epitaxy by molecular dynamics

K. Mae, K. Kyuno, R. Yamamoto

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

Abstract

Surfactant epitaxy has been expected to be a powerful method to improve thin-film growth from 3D island to layered growth, but the atomic level process of surfactant epitaxy has not been revealed yet. The purpose of this paper is to elucidate the phenomenon of surfactant epitaxy by molecular dynamic simulations. It is found that a smaller surface energy is necessary for the surfactant to be stable on the surface and that the difference of the atomic radii between the surfactant and the adatom plays an important role in the process of quick exchange of their positions.

Original languageEnglish
Pages (from-to)73-85
Number of pages13
JournalModelling and Simulation in Materials Science and Engineering
Volume4
Issue number1
DOIs
Publication statusPublished - 1996 Jan

ASJC Scopus subject areas

  • Modelling and Simulation
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Computer Science Applications

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