Thermal Analysis of the Double-Crucible Method in Continuous Silicon Czochralski Processing

Naoki Ono, Michio Kida, Yoshiaki Arai, Kensho Sahira

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Numerical simulations were performed for the melt temperature and convection in a double-crucible method. The k-epsilon turbulent flow model was applied and its results were compared to the experimental data. The calculation using the k -epsilon model converged successfully to a stable solution, while that with the laminar flow model did not. By the application of the k -epsilon model, we could simulate the temperature gradient in the thickness of the inner quartz crucible and the forced convection under the crystal. Moreover, the conclusion that the time-averaged isotherms were not much deformed was investigated from the model.

Original languageEnglish
Pages (from-to)2106-2111
Number of pages6
JournalJournal of the Electrochemical Society
Volume140
Issue number7
DOIs
Publication statusPublished - 1993 Jul

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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