Thermo-optic switch using fluorinated silicon oxide and organic spin-on-glass films

Hiroyasu Kondo, Kazuaki Inohara, Yuki Taniguchi, Junko Nakahata, Tetsuya Homma, Hideo Takahashi

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5 Citations (Scopus)

Abstract

A thermo-optic switch in a thin-film optical waveguide was investigated. Fluorinated silicon oxide (SiOF) and organic spin-on-glass (SOG) films were used as core-layer and clad-layer, respectively, in the waveguide structure. The SiOF films were formed at 23°C by a liquid-phase deposition (LPD) technique using a supersaturated hydrofluosilicic acid (H2SiF6) aqueous solution. Thermal coefficients of the refractive indices for LPD-SiOF and organic SOG films formed on silicon (Si) substrates were -4.0 × 10-6/°C, -60 × 10-6/°C at the wavelength of 632.8 nm, respectively. A high extinction ratio of 15 dB was obtained for this switch at the applied voltage of 12.8 V.

Original languageEnglish
Pages (from-to)323-325
Number of pages3
JournalOptical Review
Volume8
Issue number5
Publication statusPublished - 2001 Sep

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Keywords

  • Fluorinated silicon oxide
  • Optical switch
  • Spin-on-glass
  • Thermo-optic effect
  • Thin-film optical waveguide

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Kondo, H., Inohara, K., Taniguchi, Y., Nakahata, J., Homma, T., & Takahashi, H. (2001). Thermo-optic switch using fluorinated silicon oxide and organic spin-on-glass films. Optical Review, 8(5), 323-325.