Ti-Al, graded Al/AlTi, and Ti-Al-N coatings prepared by supersonic Free-Jet PVD

Atsushi Yumoto; Takahisa Yamamoto; Fujio Hiroki; Ichiro Shiota; Naotake Niwa

doi:10.2320/matertrans.45.1620

Ti-Al, graded Al/AlTi, and Ti-Al-N coatings prepared by supersonic Free-Jet PVD

Atsushi Yumoto, Takahisa Yamamoto, Fujio Hiroki, Ichiro Shiota, Naotake Niwa

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

The authors previously developed Supersonic Free-Jet PVD (SFJ-PVD) as a new coating method in which a coating film is formed by depositing nanoparticles at very high velocity onto a substrate. This SFJ-PVD provides a rapid deposition rate and produces a mixture of different kinds of nanoparticles formed in different evaporation chambers on the substrate. This paper describes the preparation of graded Al/ AlTi, Ti-Al, and Ti-Al-N coating films with SFJ-PVD. Ti-50 at%Al film and graded Al/AlTi film are produced by depositing Al and Ti nanoparticles formed in different evaporation chambers with the controlled evaporation rates of Al and Ti. Ti-Al-N film is produced by depositing nanoparticles formed in the evaporation chamber with a controlled partial pressure of N₂ in an atmosphere of He. Mixing Ti and Al nanoparticles by depositing them onto a substrate produces in-situ syntheses of γ-TiAl and α-Ti₃Al intermetallic compounds on the substrate regardless of the substrate temperature in these experimental conditions. A smooth, compact, and defect-free structure is formed both at the interface between the substrate and the coating films and inside the coating films. XRD analysis reveals the crystal structure of the Ti-Al-N film to be TiN, Ti ₃Al₂N₂, Ti₃AlN, and AlN.

Original language	English
Pages (from-to)	1620-1623
Number of pages	4
Journal	Materials Transactions
Volume	45
Issue number	5
DOIs	https://doi.org/10.2320/matertrans.45.1620
Publication status	Published - 2004 May
Externally published	Yes

Keywords

Functionally graded material
Nanoparticle
Supersonic gas flow
Titanium-aluminides
Titanium-aluminum-nitrides

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.2320/matertrans.45.1620

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title = "Ti-Al, graded Al/AlTi, and Ti-Al-N coatings prepared by supersonic Free-Jet PVD",

abstract = "The authors previously developed Supersonic Free-Jet PVD (SFJ-PVD) as a new coating method in which a coating film is formed by depositing nanoparticles at very high velocity onto a substrate. This SFJ-PVD provides a rapid deposition rate and produces a mixture of different kinds of nanoparticles formed in different evaporation chambers on the substrate. This paper describes the preparation of graded Al/ AlTi, Ti-Al, and Ti-Al-N coating films with SFJ-PVD. Ti-50 at%Al film and graded Al/AlTi film are produced by depositing Al and Ti nanoparticles formed in different evaporation chambers with the controlled evaporation rates of Al and Ti. Ti-Al-N film is produced by depositing nanoparticles formed in the evaporation chamber with a controlled partial pressure of N2 in an atmosphere of He. Mixing Ti and Al nanoparticles by depositing them onto a substrate produces in-situ syntheses of γ-TiAl and α-Ti3Al intermetallic compounds on the substrate regardless of the substrate temperature in these experimental conditions. A smooth, compact, and defect-free structure is formed both at the interface between the substrate and the coating films and inside the coating films. XRD analysis reveals the crystal structure of the Ti-Al-N film to be TiN, Ti 3Al2N2, Ti3AlN, and AlN.",

keywords = "Functionally graded material, Nanoparticle, Supersonic gas flow, Titanium-aluminides, Titanium-aluminum-nitrides",

author = "Atsushi Yumoto and Takahisa Yamamoto and Fujio Hiroki and Ichiro Shiota and Naotake Niwa",

year = "2004",

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T1 - Ti-Al, graded Al/AlTi, and Ti-Al-N coatings prepared by supersonic Free-Jet PVD

AU - Yumoto, Atsushi

AU - Yamamoto, Takahisa

AU - Hiroki, Fujio

AU - Shiota, Ichiro

AU - Niwa, Naotake

PY - 2004/5

Y1 - 2004/5

N2 - The authors previously developed Supersonic Free-Jet PVD (SFJ-PVD) as a new coating method in which a coating film is formed by depositing nanoparticles at very high velocity onto a substrate. This SFJ-PVD provides a rapid deposition rate and produces a mixture of different kinds of nanoparticles formed in different evaporation chambers on the substrate. This paper describes the preparation of graded Al/ AlTi, Ti-Al, and Ti-Al-N coating films with SFJ-PVD. Ti-50 at%Al film and graded Al/AlTi film are produced by depositing Al and Ti nanoparticles formed in different evaporation chambers with the controlled evaporation rates of Al and Ti. Ti-Al-N film is produced by depositing nanoparticles formed in the evaporation chamber with a controlled partial pressure of N2 in an atmosphere of He. Mixing Ti and Al nanoparticles by depositing them onto a substrate produces in-situ syntheses of γ-TiAl and α-Ti3Al intermetallic compounds on the substrate regardless of the substrate temperature in these experimental conditions. A smooth, compact, and defect-free structure is formed both at the interface between the substrate and the coating films and inside the coating films. XRD analysis reveals the crystal structure of the Ti-Al-N film to be TiN, Ti 3Al2N2, Ti3AlN, and AlN.

AB - The authors previously developed Supersonic Free-Jet PVD (SFJ-PVD) as a new coating method in which a coating film is formed by depositing nanoparticles at very high velocity onto a substrate. This SFJ-PVD provides a rapid deposition rate and produces a mixture of different kinds of nanoparticles formed in different evaporation chambers on the substrate. This paper describes the preparation of graded Al/ AlTi, Ti-Al, and Ti-Al-N coating films with SFJ-PVD. Ti-50 at%Al film and graded Al/AlTi film are produced by depositing Al and Ti nanoparticles formed in different evaporation chambers with the controlled evaporation rates of Al and Ti. Ti-Al-N film is produced by depositing nanoparticles formed in the evaporation chamber with a controlled partial pressure of N2 in an atmosphere of He. Mixing Ti and Al nanoparticles by depositing them onto a substrate produces in-situ syntheses of γ-TiAl and α-Ti3Al intermetallic compounds on the substrate regardless of the substrate temperature in these experimental conditions. A smooth, compact, and defect-free structure is formed both at the interface between the substrate and the coating films and inside the coating films. XRD analysis reveals the crystal structure of the Ti-Al-N film to be TiN, Ti 3Al2N2, Ti3AlN, and AlN.

KW - Functionally graded material

KW - Nanoparticle

KW - Supersonic gas flow

KW - Titanium-aluminides

KW - Titanium-aluminum-nitrides

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Ti-Al, graded Al/AlTi, and Ti-Al-N coatings prepared by supersonic Free-Jet PVD

Abstract

Keywords

ASJC Scopus subject areas

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