Ti-Al, graded Al/AlTi, and Ti-Al-N coatings prepared by supersonic Free-Jet PVD

Atsushi Yumoto, Takahisa Yamamoto, Fujio Hiroki, Ichiro Shiota, Naotake Niwa

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The authors previously developed Supersonic Free-Jet PVD (SFJ-PVD) as a new coating method in which a coating film is formed by depositing nanoparticles at very high velocity onto a substrate. This SFJ-PVD provides a rapid deposition rate and produces a mixture of different kinds of nanoparticles formed in different evaporation chambers on the substrate. This paper describes the preparation of graded Al/ AlTi, Ti-Al, and Ti-Al-N coating films with SFJ-PVD. Ti-50 at%Al film and graded Al/AlTi film are produced by depositing Al and Ti nanoparticles formed in different evaporation chambers with the controlled evaporation rates of Al and Ti. Ti-Al-N film is produced by depositing nanoparticles formed in the evaporation chamber with a controlled partial pressure of N2 in an atmosphere of He. Mixing Ti and Al nanoparticles by depositing them onto a substrate produces in-situ syntheses of γ-TiAl and α-Ti3Al intermetallic compounds on the substrate regardless of the substrate temperature in these experimental conditions. A smooth, compact, and defect-free structure is formed both at the interface between the substrate and the coating films and inside the coating films. XRD analysis reveals the crystal structure of the Ti-Al-N film to be TiN, Ti 3Al2N2, Ti3AlN, and AlN.

Original languageEnglish
Pages (from-to)1620-1623
Number of pages4
JournalMaterials Transactions
Volume45
Issue number5
DOIs
Publication statusPublished - 2004 May
Externally publishedYes

Fingerprint

free jets
Physical vapor deposition
coatings
Coatings
Nanoparticles
Evaporation
Substrates
nanoparticles
chambers
evaporation
evaporation rate
Deposition rates
Partial pressure
Intermetallics
partial pressure
intermetallics
coating
Crystal structure
atmospheres
Defects

Keywords

  • Functionally graded material
  • Nanoparticle
  • Supersonic gas flow
  • Titanium-aluminides
  • Titanium-aluminum-nitrides

ASJC Scopus subject areas

  • Materials Science(all)
  • Metals and Alloys

Cite this

Ti-Al, graded Al/AlTi, and Ti-Al-N coatings prepared by supersonic Free-Jet PVD. / Yumoto, Atsushi; Yamamoto, Takahisa; Hiroki, Fujio; Shiota, Ichiro; Niwa, Naotake.

In: Materials Transactions, Vol. 45, No. 5, 05.2004, p. 1620-1623.

Research output: Contribution to journalArticle

Yumoto, Atsushi ; Yamamoto, Takahisa ; Hiroki, Fujio ; Shiota, Ichiro ; Niwa, Naotake. / Ti-Al, graded Al/AlTi, and Ti-Al-N coatings prepared by supersonic Free-Jet PVD. In: Materials Transactions. 2004 ; Vol. 45, No. 5. pp. 1620-1623.
@article{cdd9fd73d9444821bb48a0ce17c4b820,
title = "Ti-Al, graded Al/AlTi, and Ti-Al-N coatings prepared by supersonic Free-Jet PVD",
abstract = "The authors previously developed Supersonic Free-Jet PVD (SFJ-PVD) as a new coating method in which a coating film is formed by depositing nanoparticles at very high velocity onto a substrate. This SFJ-PVD provides a rapid deposition rate and produces a mixture of different kinds of nanoparticles formed in different evaporation chambers on the substrate. This paper describes the preparation of graded Al/ AlTi, Ti-Al, and Ti-Al-N coating films with SFJ-PVD. Ti-50 at{\%}Al film and graded Al/AlTi film are produced by depositing Al and Ti nanoparticles formed in different evaporation chambers with the controlled evaporation rates of Al and Ti. Ti-Al-N film is produced by depositing nanoparticles formed in the evaporation chamber with a controlled partial pressure of N2 in an atmosphere of He. Mixing Ti and Al nanoparticles by depositing them onto a substrate produces in-situ syntheses of γ-TiAl and α-Ti3Al intermetallic compounds on the substrate regardless of the substrate temperature in these experimental conditions. A smooth, compact, and defect-free structure is formed both at the interface between the substrate and the coating films and inside the coating films. XRD analysis reveals the crystal structure of the Ti-Al-N film to be TiN, Ti 3Al2N2, Ti3AlN, and AlN.",
keywords = "Functionally graded material, Nanoparticle, Supersonic gas flow, Titanium-aluminides, Titanium-aluminum-nitrides",
author = "Atsushi Yumoto and Takahisa Yamamoto and Fujio Hiroki and Ichiro Shiota and Naotake Niwa",
year = "2004",
month = "5",
doi = "10.2320/matertrans.45.1620",
language = "English",
volume = "45",
pages = "1620--1623",
journal = "Materials Transactions",
issn = "1345-9678",
publisher = "Japan Institute of Metals (JIM)",
number = "5",

}

TY - JOUR

T1 - Ti-Al, graded Al/AlTi, and Ti-Al-N coatings prepared by supersonic Free-Jet PVD

AU - Yumoto, Atsushi

AU - Yamamoto, Takahisa

AU - Hiroki, Fujio

AU - Shiota, Ichiro

AU - Niwa, Naotake

PY - 2004/5

Y1 - 2004/5

N2 - The authors previously developed Supersonic Free-Jet PVD (SFJ-PVD) as a new coating method in which a coating film is formed by depositing nanoparticles at very high velocity onto a substrate. This SFJ-PVD provides a rapid deposition rate and produces a mixture of different kinds of nanoparticles formed in different evaporation chambers on the substrate. This paper describes the preparation of graded Al/ AlTi, Ti-Al, and Ti-Al-N coating films with SFJ-PVD. Ti-50 at%Al film and graded Al/AlTi film are produced by depositing Al and Ti nanoparticles formed in different evaporation chambers with the controlled evaporation rates of Al and Ti. Ti-Al-N film is produced by depositing nanoparticles formed in the evaporation chamber with a controlled partial pressure of N2 in an atmosphere of He. Mixing Ti and Al nanoparticles by depositing them onto a substrate produces in-situ syntheses of γ-TiAl and α-Ti3Al intermetallic compounds on the substrate regardless of the substrate temperature in these experimental conditions. A smooth, compact, and defect-free structure is formed both at the interface between the substrate and the coating films and inside the coating films. XRD analysis reveals the crystal structure of the Ti-Al-N film to be TiN, Ti 3Al2N2, Ti3AlN, and AlN.

AB - The authors previously developed Supersonic Free-Jet PVD (SFJ-PVD) as a new coating method in which a coating film is formed by depositing nanoparticles at very high velocity onto a substrate. This SFJ-PVD provides a rapid deposition rate and produces a mixture of different kinds of nanoparticles formed in different evaporation chambers on the substrate. This paper describes the preparation of graded Al/ AlTi, Ti-Al, and Ti-Al-N coating films with SFJ-PVD. Ti-50 at%Al film and graded Al/AlTi film are produced by depositing Al and Ti nanoparticles formed in different evaporation chambers with the controlled evaporation rates of Al and Ti. Ti-Al-N film is produced by depositing nanoparticles formed in the evaporation chamber with a controlled partial pressure of N2 in an atmosphere of He. Mixing Ti and Al nanoparticles by depositing them onto a substrate produces in-situ syntheses of γ-TiAl and α-Ti3Al intermetallic compounds on the substrate regardless of the substrate temperature in these experimental conditions. A smooth, compact, and defect-free structure is formed both at the interface between the substrate and the coating films and inside the coating films. XRD analysis reveals the crystal structure of the Ti-Al-N film to be TiN, Ti 3Al2N2, Ti3AlN, and AlN.

KW - Functionally graded material

KW - Nanoparticle

KW - Supersonic gas flow

KW - Titanium-aluminides

KW - Titanium-aluminum-nitrides

UR - http://www.scopus.com/inward/record.url?scp=3342942589&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=3342942589&partnerID=8YFLogxK

U2 - 10.2320/matertrans.45.1620

DO - 10.2320/matertrans.45.1620

M3 - Article

AN - SCOPUS:3342942589

VL - 45

SP - 1620

EP - 1623

JO - Materials Transactions

JF - Materials Transactions

SN - 1345-9678

IS - 5

ER -