Abstract
We report investigation of light-induced damage threshold (LIDT) in purified silica (transmission band down to 160 nm) by 350 fs laser pulses at the wavelength of 795 nm and 498 nm. Focusing a single pulse by a high numeric aperture NA = 1.35 microscope objective lens results in one of the lowest single-shot bulk LIDT values reported so far, 5 J/cm2, while the surface ablation threshold is 2.5J/cm2 with both values being well below the critical self-focusing power in silica. Furthermore, we report the peculiarities of damage by two-pulse irradiation (duration of each pulse is 440 fs), where both pulses have energies at the level of 0.5 × LIDT. Comparison between the experimental data and numeric simulation, which takes into account optical free-carrier generation and relaxation, demonstrates that these processes can explain the measured self-focusing, super-continuum generation, and lightinduced damage threshold values. We argue that use of high numeric aperture objective, despite substantial temporal pulse stretching, results in tight focusing which is capable of overcoming the beam self-focusing, and the resulting fabrication quality is comparable to that obtained using shorter pulses.
| Original language | English |
|---|---|
| Pages (from-to) | 98-109 |
| Number of pages | 12 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 4274 |
| DOIs | |
| Publication status | Published - 2001 Jun 29 |
| Event | Laser Applications in Microelectronic and Optoelectronic Manufacturing VI 2001 - San Jose, United States Duration: 2001 Jan 20 → 2001 Jan 26 |
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Keywords
- Laser microfabrication
- Light-induced damage threshold
- Silica
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering
Cite this
Time resolved study of femtosecond microfabrication in silica glass. / Misawa, Hiroaki; Juodkazis, Saulius; Marcinkevičius, Andrius; Watanabe, Mitsuru; Mizeikis, Vygantas; Matsuo, Shigeki.
In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 4274, 29.06.2001, p. 98-109.Research output: Contribution to journal › Conference article
}
TY - JOUR
T1 - Time resolved study of femtosecond microfabrication in silica glass
AU - Misawa, Hiroaki
AU - Juodkazis, Saulius
AU - Marcinkevičius, Andrius
AU - Watanabe, Mitsuru
AU - Mizeikis, Vygantas
AU - Matsuo, Shigeki
PY - 2001/6/29
Y1 - 2001/6/29
N2 - We report investigation of light-induced damage threshold (LIDT) in purified silica (transmission band down to 160 nm) by 350 fs laser pulses at the wavelength of 795 nm and 498 nm. Focusing a single pulse by a high numeric aperture NA = 1.35 microscope objective lens results in one of the lowest single-shot bulk LIDT values reported so far, 5 J/cm2, while the surface ablation threshold is 2.5J/cm2 with both values being well below the critical self-focusing power in silica. Furthermore, we report the peculiarities of damage by two-pulse irradiation (duration of each pulse is 440 fs), where both pulses have energies at the level of 0.5 × LIDT. Comparison between the experimental data and numeric simulation, which takes into account optical free-carrier generation and relaxation, demonstrates that these processes can explain the measured self-focusing, super-continuum generation, and lightinduced damage threshold values. We argue that use of high numeric aperture objective, despite substantial temporal pulse stretching, results in tight focusing which is capable of overcoming the beam self-focusing, and the resulting fabrication quality is comparable to that obtained using shorter pulses.
AB - We report investigation of light-induced damage threshold (LIDT) in purified silica (transmission band down to 160 nm) by 350 fs laser pulses at the wavelength of 795 nm and 498 nm. Focusing a single pulse by a high numeric aperture NA = 1.35 microscope objective lens results in one of the lowest single-shot bulk LIDT values reported so far, 5 J/cm2, while the surface ablation threshold is 2.5J/cm2 with both values being well below the critical self-focusing power in silica. Furthermore, we report the peculiarities of damage by two-pulse irradiation (duration of each pulse is 440 fs), where both pulses have energies at the level of 0.5 × LIDT. Comparison between the experimental data and numeric simulation, which takes into account optical free-carrier generation and relaxation, demonstrates that these processes can explain the measured self-focusing, super-continuum generation, and lightinduced damage threshold values. We argue that use of high numeric aperture objective, despite substantial temporal pulse stretching, results in tight focusing which is capable of overcoming the beam self-focusing, and the resulting fabrication quality is comparable to that obtained using shorter pulses.
KW - Laser microfabrication
KW - Light-induced damage threshold
KW - Silica
UR - http://www.scopus.com/inward/record.url?scp=0141875161&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0141875161&partnerID=8YFLogxK
U2 - 10.1117/12.432501
DO - 10.1117/12.432501
M3 - Conference article
AN - SCOPUS:0141875161
VL - 4274
SP - 98
EP - 109
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
SN - 0277-786X
ER -