Ultra-low resistance direct contact Cu via technology using in-situ chemical vapor cleaning

Y.Tsuychiya Y.Tsuychiya, K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, T.Kikkawa T.Kikkawa, Y.Hayashi Y.Hayashi, A.Kobayashi A.Kobayashi, A.Skiguchi A.Skiguchi, Kazuyoshi Ueno

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)
Original languageEnglish
Pages (from-to)59-60
Journal1997 Symposium on VLSI Technology Digest of Technical Papers
Publication statusPublished - 1997 Jun 1

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