Original language | English |
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Pages (from-to) | 59-60 |
Journal | 1997 Symposium on VLSI Technology Digest of Technical Papers |
Publication status | Published - 1997 Jun 1 |
Ultra-low resistance direct contact Cu via technology using in-situ chemical vapor cleaning
Y.Tsuychiya Y.Tsuychiya, K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, T.Kikkawa T.Kikkawa, Y.Hayashi Y.Hayashi, A.Kobayashi A.Kobayashi, A.Skiguchi A.Skiguchi, Kazuyoshi Ueno
Research output: Contribution to journal › Article › peer-review
5
Citations
(Scopus)