Ultra-low resistance direct contact Cu via technology using in-situ chemical vapor cleaning

Y.Tsuychiya Y.Tsuychiya, K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, T.Kikkawa T.Kikkawa, Y.Hayashi Y.Hayashi, A.Kobayashi A.Kobayashi, A.Skiguchi A.Skiguchi, Kazuyoshi Ueno

Research output: Contribution to journalArticle

5 Citations (Scopus)
Original languageEnglish
Pages (from-to)59-60
Journal1997 Symposium on VLSI Technology Digest of Technical Papers
Publication statusPublished - 1997 Jun 1

Cite this

Y.Tsuychiya, Y. T., K.Ueno, K. U., V.M.Donnelly, V. M. D., T.Kikkawa, T. K., Y.Hayashi, Y. H., A.Kobayashi, A. K., ... Ueno, K. (1997). Ultra-low resistance direct contact Cu via technology using in-situ chemical vapor cleaning. 1997 Symposium on VLSI Technology Digest of Technical Papers, 59-60.

Ultra-low resistance direct contact Cu via technology using in-situ chemical vapor cleaning. / Y.Tsuychiya, Y.Tsuychiya; K.Ueno, K.Ueno; V.M.Donnelly, V.M.Donnelly; T.Kikkawa, T.Kikkawa; Y.Hayashi, Y.Hayashi; A.Kobayashi, A.Kobayashi; A.Skiguchi, A.Skiguchi; Ueno, Kazuyoshi.

In: 1997 Symposium on VLSI Technology Digest of Technical Papers, 01.06.1997, p. 59-60.

Research output: Contribution to journalArticle

Y.Tsuychiya, YT, K.Ueno, KU, V.M.Donnelly, VMD, T.Kikkawa, TK, Y.Hayashi, YH, A.Kobayashi, AK, A.Skiguchi, AS & Ueno, K 1997, 'Ultra-low resistance direct contact Cu via technology using in-situ chemical vapor cleaning', 1997 Symposium on VLSI Technology Digest of Technical Papers, pp. 59-60.
Y.Tsuychiya YT, K.Ueno KU, V.M.Donnelly VMD, T.Kikkawa TK, Y.Hayashi YH, A.Kobayashi AK et al. Ultra-low resistance direct contact Cu via technology using in-situ chemical vapor cleaning. 1997 Symposium on VLSI Technology Digest of Technical Papers. 1997 Jun 1;59-60.
Y.Tsuychiya, Y.Tsuychiya ; K.Ueno, K.Ueno ; V.M.Donnelly, V.M.Donnelly ; T.Kikkawa, T.Kikkawa ; Y.Hayashi, Y.Hayashi ; A.Kobayashi, A.Kobayashi ; A.Skiguchi, A.Skiguchi ; Ueno, Kazuyoshi. / Ultra-low resistance direct contact Cu via technology using in-situ chemical vapor cleaning. In: 1997 Symposium on VLSI Technology Digest of Technical Papers. 1997 ; pp. 59-60.
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