Uniform (111) textured Cu CVD on vacuum annealed Cu seed layer

K.Ueno K.Ueno, A.Sekiguchi A.Sekiguchi, A.Kobayashi A.Kobayashi, Kazuyoshi Ueno

Research output: Contribution to journalArticle

14 Citations (Scopus)
Original languageEnglish
Pages (from-to)119-121
JournalProceedings of 1998 International Interconnect Technology Conference
Publication statusPublished - 1998 Jun 1

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