Uniform (111) textured Cu CVD on vacuum annealed Cu seed layer

K.Ueno K.Ueno, A.Sekiguchi A.Sekiguchi, A.Kobayashi A.Kobayashi, Kazuyoshi Ueno

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	119-121
Journal	Proceedings of 1998 International Interconnect Technology Conference
Publication status	Published - 1998 Jun 1

Cite this

@article{1a46d05509934490a13dbb100028a37f,

title = "Uniform (111) textured Cu CVD on vacuum annealed Cu seed layer",

author = "K.Ueno K.Ueno and A.Sekiguchi A.Sekiguchi and A.Kobayashi A.Kobayashi and Kazuyoshi Ueno",

year = "1998",

month = jun,

day = "1",

language = "English",

pages = "119--121",

journal = "Proceedings of 1998 International Interconnect Technology Conference",

}

TY - JOUR

T1 - Uniform (111) textured Cu CVD on vacuum annealed Cu seed layer

AU - K.Ueno, K.Ueno

AU - A.Sekiguchi, A.Sekiguchi

AU - A.Kobayashi, A.Kobayashi

AU - Ueno, Kazuyoshi

PY - 1998/6/1

Y1 - 1998/6/1

M3 - Article

SP - 119

EP - 121

JO - Proceedings of 1998 International Interconnect Technology Conference

JF - Proceedings of 1998 International Interconnect Technology Conference

ER -