Uniform (111) textured Cu CVD on vacuum annealed Cu seed layer

K.Ueno K.Ueno, A.Sekiguchi A.Sekiguchi, A.Kobayashi A.Kobayashi, Kazuyoshi Ueno

Research output: Contribution to journalArticle

14 Citations (Scopus)
Original languageEnglish
Pages (from-to)119-121
JournalProceedings of 1998 International Interconnect Technology Conference
Publication statusPublished - 1998 Jun 1

Cite this

Uniform (111) textured Cu CVD on vacuum annealed Cu seed layer. / K.Ueno, K.Ueno; A.Sekiguchi, A.Sekiguchi; A.Kobayashi, A.Kobayashi; Ueno, Kazuyoshi.

In: Proceedings of 1998 International Interconnect Technology Conference, 01.06.1998, p. 119-121.

Research output: Contribution to journalArticle

K.Ueno, K.Ueno ; A.Sekiguchi, A.Sekiguchi ; A.Kobayashi, A.Kobayashi ; Ueno, Kazuyoshi. / Uniform (111) textured Cu CVD on vacuum annealed Cu seed layer. In: Proceedings of 1998 International Interconnect Technology Conference. 1998 ; pp. 119-121.
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AU - Ueno, Kazuyoshi

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