Various bonding forms of OH groups in hydrogen-treated silica

Manabu Kitagawa, Hiroyuki Nishikawa, Yoshimichi Ohki, Yoshimasa Hama

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

The bonding state of OH groups in silica glasses is studied by examining infrared absorption spectra and thermal annealing characteristics of γ-induced paramagnetic detect centers. When an oxygen-rich silica is treated by hydrogen, OH groups exist in the form of those hydrogen-bonded with nonbridging oxygen (≡Si-O- - - -H-O-Si≡) besides the forms of H2O and ≡Si-O-H.

Original languageEnglish
Pages (from-to)2378-2380
Number of pages3
JournalJournal of Applied Physics
Volume74
Issue number4
DOIs
Publication statusPublished - 1993
Externally publishedYes

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silicon dioxide
silica glass
oxygen
hydrogen
infrared absorption
infrared spectra
absorption spectra
annealing

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Various bonding forms of OH groups in hydrogen-treated silica. / Kitagawa, Manabu; Nishikawa, Hiroyuki; Ohki, Yoshimichi; Hama, Yoshimasa.

In: Journal of Applied Physics, Vol. 74, No. 4, 1993, p. 2378-2380.

Research output: Contribution to journalArticle

Kitagawa, Manabu ; Nishikawa, Hiroyuki ; Ohki, Yoshimichi ; Hama, Yoshimasa. / Various bonding forms of OH groups in hydrogen-treated silica. In: Journal of Applied Physics. 1993 ; Vol. 74, No. 4. pp. 2378-2380.
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