Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates

Takanori Sakamoto; Shiro Shimada; Hajime Kiyono; Jiro Tsujino; Isao Yamazaki

doi:10.1016/j.mseb.2010.05.010

Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates

Takanori Sakamoto, Shiro Shimada, Hajime Kiyono, Jiro Tsujino, Isao Yamazaki

Research output: Contribution to journal › Article

3 Citations (Scopus)

Abstract

Double-layer TiN/PSZ film coatings were deposited on Si wafers and WC-Co cutting tools from Ti-, Zr-, and Y-alkoxide solutions by thermal plasma chemical vapor deposition (CVD) containing water vapor. The partially stabilized zirconia (PSZ) layer was coated on a TiN film by oxidation of Zr- and Y-alkoxides with H₂O supplied by both constant and step-wise methods. Double-layer TiN/PSZ coatings deposited on Si wafers and WC-Co by the two H₂O supply methods were approximately 2 μm thick. TEM observation showed that the interface between the TiN and PSZ in the double-layer TiN/PSZ formed by the step-wise H₂O supply is more adhesive than under constant H₂O supply. Double-layer TiN/PSZ films coated on WC-Co substrates by the step-wise supply exhibited good crater wear resistance, comparable to a commercial double-layer TiN/Al₂O₃ coating by thermal CVD.

Original language	English
Pages (from-to)	201-206
Number of pages	6
Journal	Materials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume	172
Issue number	2
DOIs	https://doi.org/10.1016/j.mseb.2010.05.010
Publication status	Published - 2010 Aug 25

Keywords

Chemical vapor deposition
Partial stabilized zirconia
Thermal plasma
Thin films
Wear resistance

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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Sakamoto, T., Shimada, S., Kiyono, H., Tsujino, J., & Yamazaki, I. (2010). Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates. Materials Science and Engineering B: Solid-State Materials for Advanced Technology, 172(2), 201-206. https://doi.org/10.1016/j.mseb.2010.05.010

Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates. / Sakamoto, Takanori; Shimada, Shiro; Kiyono, Hajime; Tsujino, Jiro; Yamazaki, Isao.

In: Materials Science and Engineering B: Solid-State Materials for Advanced Technology, Vol. 172, No. 2, 25.08.2010, p. 201-206.

Research output: Contribution to journal › Article

@article{469d1232ede14cd58b3d90daf4b5c982,

title = "Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates",

abstract = "Double-layer TiN/PSZ film coatings were deposited on Si wafers and WC-Co cutting tools from Ti-, Zr-, and Y-alkoxide solutions by thermal plasma chemical vapor deposition (CVD) containing water vapor. The partially stabilized zirconia (PSZ) layer was coated on a TiN film by oxidation of Zr- and Y-alkoxides with H2O supplied by both constant and step-wise methods. Double-layer TiN/PSZ coatings deposited on Si wafers and WC-Co by the two H2O supply methods were approximately 2 μm thick. TEM observation showed that the interface between the TiN and PSZ in the double-layer TiN/PSZ formed by the step-wise H2O supply is more adhesive than under constant H2O supply. Double-layer TiN/PSZ films coated on WC-Co substrates by the step-wise supply exhibited good crater wear resistance, comparable to a commercial double-layer TiN/Al2O3 coating by thermal CVD.",

keywords = "Chemical vapor deposition, Partial stabilized zirconia, Thermal plasma, Thin films, Wear resistance",

author = "Takanori Sakamoto and Shiro Shimada and Hajime Kiyono and Jiro Tsujino and Isao Yamazaki",

year = "2010",

month = aug,

day = "25",

doi = "10.1016/j.mseb.2010.05.010",

language = "English",

volume = "172",

pages = "201--206",

journal = "Materials Science and Engineering B: Solid-State Materials for Advanced Technology",

issn = "0921-5107",

publisher = "Elsevier BV",

number = "2",

}

TY - JOUR

T1 - Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates

AU - Sakamoto, Takanori

AU - Shimada, Shiro

AU - Kiyono, Hajime

AU - Tsujino, Jiro

AU - Yamazaki, Isao

PY - 2010/8/25

Y1 - 2010/8/25

N2 - Double-layer TiN/PSZ film coatings were deposited on Si wafers and WC-Co cutting tools from Ti-, Zr-, and Y-alkoxide solutions by thermal plasma chemical vapor deposition (CVD) containing water vapor. The partially stabilized zirconia (PSZ) layer was coated on a TiN film by oxidation of Zr- and Y-alkoxides with H2O supplied by both constant and step-wise methods. Double-layer TiN/PSZ coatings deposited on Si wafers and WC-Co by the two H2O supply methods were approximately 2 μm thick. TEM observation showed that the interface between the TiN and PSZ in the double-layer TiN/PSZ formed by the step-wise H2O supply is more adhesive than under constant H2O supply. Double-layer TiN/PSZ films coated on WC-Co substrates by the step-wise supply exhibited good crater wear resistance, comparable to a commercial double-layer TiN/Al2O3 coating by thermal CVD.

AB - Double-layer TiN/PSZ film coatings were deposited on Si wafers and WC-Co cutting tools from Ti-, Zr-, and Y-alkoxide solutions by thermal plasma chemical vapor deposition (CVD) containing water vapor. The partially stabilized zirconia (PSZ) layer was coated on a TiN film by oxidation of Zr- and Y-alkoxides with H2O supplied by both constant and step-wise methods. Double-layer TiN/PSZ coatings deposited on Si wafers and WC-Co by the two H2O supply methods were approximately 2 μm thick. TEM observation showed that the interface between the TiN and PSZ in the double-layer TiN/PSZ formed by the step-wise H2O supply is more adhesive than under constant H2O supply. Double-layer TiN/PSZ films coated on WC-Co substrates by the step-wise supply exhibited good crater wear resistance, comparable to a commercial double-layer TiN/Al2O3 coating by thermal CVD.

KW - Chemical vapor deposition

KW - Partial stabilized zirconia

KW - Thermal plasma

KW - Thin films

KW - Wear resistance

UR - http://www.scopus.com/inward/record.url?scp=77955307537&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77955307537&partnerID=8YFLogxK

U2 - 10.1016/j.mseb.2010.05.010

DO - 10.1016/j.mseb.2010.05.010

M3 - Article

AN - SCOPUS:77955307537

VL - 172

SP - 201

EP - 206

JO - Materials Science and Engineering B: Solid-State Materials for Advanced Technology

JF - Materials Science and Engineering B: Solid-State Materials for Advanced Technology

SN - 0921-5107

IS - 2

ER -