Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates

Takanori Sakamoto, Shiro Shimada, Hajime Kiyono, Jiro Tsujino, Isao Yamazaki

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Double-layer TiN/PSZ film coatings were deposited on Si wafers and WC-Co cutting tools from Ti-, Zr-, and Y-alkoxide solutions by thermal plasma chemical vapor deposition (CVD) containing water vapor. The partially stabilized zirconia (PSZ) layer was coated on a TiN film by oxidation of Zr- and Y-alkoxides with H2O supplied by both constant and step-wise methods. Double-layer TiN/PSZ coatings deposited on Si wafers and WC-Co by the two H2O supply methods were approximately 2 μm thick. TEM observation showed that the interface between the TiN and PSZ in the double-layer TiN/PSZ formed by the step-wise H2O supply is more adhesive than under constant H2O supply. Double-layer TiN/PSZ films coated on WC-Co substrates by the step-wise supply exhibited good crater wear resistance, comparable to a commercial double-layer TiN/Al2O3 coating by thermal CVD.

Original languageEnglish
Pages (from-to)201-206
Number of pages6
JournalMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume172
Issue number2
DOIs
Publication statusPublished - 2010 Aug 25
Externally publishedYes

Fingerprint

Plasma Gases
thermal plasmas
Steam
zirconium oxides
Zirconia
Water vapor
water vapor
Chemical vapor deposition
vapor deposition
Plasmas
coatings
Coatings
Substrates
alkoxides
wafers
Cutting tools
wear resistance
craters
adhesives
Wear resistance

Keywords

  • Chemical vapor deposition
  • Partial stabilized zirconia
  • Thermal plasma
  • Thin films
  • Wear resistance

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates. / Sakamoto, Takanori; Shimada, Shiro; Kiyono, Hajime; Tsujino, Jiro; Yamazaki, Isao.

In: Materials Science and Engineering B: Solid-State Materials for Advanced Technology, Vol. 172, No. 2, 25.08.2010, p. 201-206.

Research output: Contribution to journalArticle

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AU - Yamazaki, Isao

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