What is the essence of Vfb shifts in high-k gate stack?

T.Nabatame T.Nabatame, K.Iwamoto K.Iwamoto, K.Akiyama K.Akiyama, Y.Nunoshige Y.Nunoshige, H.Nunoshige H.Nunoshige, H.Ota H.Ota, A.Toriumi A.Toriumi, T.Ohishi T.Ohishi, Tomoji Oishi

Research output: Contribution to journalArticle

11 Citations (Scopus)
Original languageEnglish
Pages (from-to)543
JournalElectrochemical Society (ECS) Transactions
Volume11
Publication statusPublished - 2007 Oct 7

Cite this

T.Nabatame, T. N., K.Iwamoto, K. I., K.Akiyama, K. A., Y.Nunoshige, Y. N., H.Nunoshige, H. N., H.Ota, H. O., ... Oishi, T. (2007). What is the essence of Vfb shifts in high-k gate stack? Electrochemical Society (ECS) Transactions, 11, 543.