検索結果
2002
Yano, R. ,
Okada, D. ,
Yap, C. C. ,
Mabuchi, K. ,
Muguruma, H. &
Saito, T. K. ,
2002 7月 19 ,
In: NeuroReport. 13 ,
10 ,
p. 1263-1266 4 p. 研究成果: Article › 査読
Microinjections
100%
Lasers
73%
Neurons
55%
Central Nervous System
19%
Photosensitizing Agents
15%
Kakehata, M. ,
Fujihira, Y. ,
Takada, H. ,
Kobayashi, Y. ,
Torizuka, K. ,
Homma, T. &
Takahashi, H. ,
2002 6月 ,
In: Applied Physics B: Lasers and Optics. 74 ,
SUPPL. ,
p. S43-S50 研究成果: Article › 査読
envelopes
100%
pulses
57%
lasers
50%
time lag
49%
harmonics
40%
Arikawa, H. ,
Kanie, T. ,
Fujii, K. ,
Fukui, K. &
Homma, T. ,
2002 6月 ,
In: Dental Materials Journal. 21 ,
2 ,
p. 147-155 9 p. 研究成果: Article › 査読
Enamels
100%
Wave filters
98%
Composite Resins
84%
Dental Enamel
77%
Resins
65%
Muguruma, H. ,
Matsumura, K. &
Hotta, S. ,
2002 2月 22 ,
In: Thin Solid Films. 405 ,
1-2 ,
p. 77-80 4 p. 研究成果: Article › 査読
Molecular orientation
100%
Vapor deposition
98%
Polyamides
75%
Molecular Orientation
71%
Polymerization
70%
Saito, T. K. ,
Muguruma, H. &
Mabuchi, K. ,
2002 ,
In: Biotechnology Letters. 24 ,
4 ,
p. 309-314 6 p. 研究成果: Article › 査読
Cell membranes
100%
Microinjections
82%
Cells
72%
Animals
71%
Rats
44%
2001
Saito, M. ,
Eto, H. ,
Makino, N. ,
Omiya, K. ,
Homma, T. &
Nagatomo, T. ,
2001 9月 ,
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 40 ,
9 A ,
p. 5271-5274 4 p. 研究成果: Article › 査読
Photoresists
100%
Silicon nitride
95%
photoresists
83%
silicon nitrides
76%
Gas mixtures
66%
Metal ions
100%
Silicate Glass
85%
Silicates
80%
recycling
78%
metal ions
74%
Saito, M. ,
Eto, H. ,
Omiya, K. ,
Homma, T. &
Nagatomo, T. ,
2001 12月 1 ,
In: Journal of the Electrochemical Society. 148 ,
2 ,
p. G59-G62 研究成果: Article › 査読
Ashing
100%
Photoresists
99%
Ammonia
83%
Plasmas
72%
Etching
63%
Hiratsuka, A. ,
Kojima, K. I. ,
Suzuki, H. ,
Muguruma, H. ,
Ikebukuro, K. &
Karube, I. ,
2001 ,
In: Analyst. 126 ,
5 ,
p. 658-663 6 p. 研究成果: Article › 査読
Glucose sensors
100%
Needles
66%
Thin films
60%
Plasmas
58%
glucose
58%
Muguruma, H. ,
Hiratsuka, A. ,
Kojima, K. I. ,
Suzuki, H. ,
Ikebukuro, K. &
Karube, I. ,
2001 ,
In: IEEJ Transactions on Sensors and Micromachines. 121 ,
8 ,
p. 445-451 7 p. 研究成果: Article › 査読
Biosensors
100%
Glucose
92%
Needles
85%
Thin films
77%
Plasmas
75%
Saito, M. ,
Eto, H. ,
Omiya, K. ,
Homma, T. &
Nagatomo, T. ,
2001 7月 ,
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 40 ,
7 ,
p. 4475-4478 4 p. 研究成果: Article › 査読
carbon tetrafluoride
100%
Photoresists
76%
Gas mixtures
68%
Ammonia
64%
photoresists
63%
Saito, T. K. ,
Takahashi, M. ,
Muguruma, H. ,
Niki, E. &
Mabuchi, K. ,
2001 8月 30 ,
In: Journal of Photochemistry and Photobiology B: Biology. 61 ,
3 ,
p. 114-121 8 p. 研究成果: Article › 査読
alpha-terthienyl
100%
Phototoxic Dermatitis
51%
membranes
35%
damage
34%
Photosensitizing Agents
29%
Thin films
100%
decomposition
80%
preparation
77%
Decomposition
76%
Metals
67%
Kakehata, M. ,
Takada, H. ,
Kobayashi, Y. ,
Torizuka, K. ,
Fujihira, Y. ,
Homma, T. &
Takahashi, H. ,
2001 9月 15 ,
In: Optics Letters. 26 ,
18 ,
p. 1436-1438 3 p. 研究成果: Article › 査読
shot
100%
envelopes
90%
interferometry
89%
interference
71%
continuums
50%
Homma, T. ,
Kondo, H. ,
Inohara, K. ,
Nomoto, M. ,
Sakamoto, M. ,
Ariyama, Y. &
Takahashi, H. ,
2001 7月 23 ,
In: Thin Solid Films. 392 ,
1 ,
p. 107-112 6 p. 研究成果: Article › 査読
Silicon oxides
100%
Silicon Oxide
85%
silicon oxides
72%
Surface treatment
72%
Surface Modification
59%
Kondo, H. ,
Inohara, K. ,
Taniguchi, Y. ,
Nakahata, J. ,
Homma, T. &
Takahashi, H. ,
2001 1月 1 ,
In: Optical Review. 8 ,
5 ,
p. 323-325 3 p. 研究成果: Article › 査読
silicon oxides
100%
switches
78%
optics
68%
glass
55%
liquid phases
53%
2000
Saito, M. ,
Kataoka, Y. ,
Homma, T. &
Nagatomo, T. ,
2000 12月 1 ,
In: Journal of the Electrochemical Society. 147 ,
12 ,
p. 4630-4632 3 p. 研究成果: Article › 査読
Chlorine
100%
Silicon Dioxide
99%
Water vapor
91%
Etching
87%
Silica
84%
Homma, T. ,
Ariyama, Y. ,
Kondo, H. ,
Sakamoto, M. ,
Kanegae, S. ,
Itoh, M. ,
Yamaguchi, M. &
Takahashi, H. ,
2000 3月 1 ,
In: Journal of the Electrochemical Society. 147 ,
3 ,
p. 1141-1144 4 p. 研究成果: Article › 査読
Optical waveguides
100%
Silicon oxides
97%
Optical properties
83%
Silicon Oxide
83%
Thin films
63%
Yamaguchi, M. ,
Hiraki, K. ,
Nagatomo, T. &
Masuda, Y. ,
2000 9月 ,
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 39 ,
9 B ,
p. 5512-5516 5 p. 研究成果: Article › 査読
Bismuth
100%
Ferroelectric materials
98%
bismuth
73%
Ferroelectric devices
71%
preparation
54%
Homma, T. ,
Kondo, H. ,
Sakamoto, M. ,
Nomoto, M. ,
Inohara, K. ,
Ariyama, Y. ,
Itoh, M. &
Takahashi, H. ,
2000 1月 1 ,
In: Optical Review. 7 ,
6 ,
p. 505-510 6 p. 研究成果: Article › 査読
silicon oxides
100%
optical waveguides
93%
glass
55%
liquid phases
50%
thin films
48%
Koike, Y. ,
Ueha, S. ,
Okonogi, A. ,
Amano, T. ,
Nakamura, K. &
Hashimoto, Y. ,
2000 1月 1 ,
In: Proceedings of the IEEE Ultrasonics Symposium. 1 ,
p. 671-674 4 p. 研究成果: Article › 査読
acoustic levitation
100%
near fields
53%
acoustic streaming
28%
acoustics
12%
1999
Homma, T. ,
Yamaguchi, M. ,
Kutsuzawa, Y. &
Otsuka, N. ,
1999 2月 26 ,
In: Thin Solid Films. 340 ,
1 ,
p. 237-241 5 p. 研究成果: Article › 査読
siloxanes
100%
Polyimides
89%
Siloxane
79%
polyimides
78%
Polyimide Macromolecule
74%
Thin films
100%
Remanence
80%
preparation
77%
Buffer layers
75%
Substrates
74%
1998
Lattice constants
100%
Thin films
95%
grain size
75%
thin films
51%
Remanence
51%
Dielectric films
100%
Dielectric Film
98%
Permittivity
67%
Integrated circuits
62%
Dielectric Constant
61%
Homma, T. ,
Satoh, A. ,
Okada, S. ,
Itoh, M. ,
Yamaguchi, M. &
Takahashi, H. ,
1998 ,
In: IEEE Transactions on Instrumentation and Measurement. 47 ,
3 ,
p. 698-702 5 p. 研究成果: Article › 査読
Optical waveguides
100%
Silicon oxides
97%
Optical properties
83%
Oxide films
83%
silicon oxides
71%
1997
Kojima, H. ,
Ozawa, A. ,
Takahashi, T. ,
Nagaoka, M. ,
Homma, T. ,
Nagatomo, T. &
Omoto, O. ,
1997 10月 ,
In: Journal of the Electrochemical Society. 144 ,
10 ,
p. 3628-3633 6 p. 研究成果: Article › 査読
Electroluminescence
100%
Perylene
56%
Transport Layer
47%
Electron Transport
40%
Activation energy
39%
Optical properties
100%
Dielectric properties
97%
Dielectric Property
80%
Thin films
75%
dielectric properties
66%
Buffer layers
100%
Ferroelectric thin films
81%
Thin films
66%
thin films
36%
Remanence
35%
1996
Silicon oxides
100%
Oxide films
85%
Silicon Oxide
85%
silicon oxides
72%
oxide films
62%
Ferroelectric thin films
100%
Silicon wafers
69%
Thin films
54%
Remanence
43%
wafers
42%
Yamaguchi, M. ,
Kawanabe, K. ,
Nagatomo, T. &
Omoto, O. ,
1996 10月 1 ,
In: Materials Science and Engineering B. 41 ,
1 ,
p. 138-142 5 p. 研究成果: Article › 査読
Thin films
100%
Permittivity
79%
preparation
77%
characterization
58%
permittivity
55%
1995
Physical properties
100%
physical properties
87%
wafers
83%
Permittivity
74%
Ferroelectricity
70%
Multichip modules
100%
Substrates
34%
Electric wiring
26%
Temperature control
23%
Thin films
22%