西川 宏之

研究成果

年別の研究成果 1989 1994 1995 1996 1997 2007 2009 2010 2011 2012 2022

• 139 Article
• 17 Conference contribution
• 9 Conference article
• 8 Paper
• 1 その他
  • 1 Review article

年別の研究成果

年別の研究成果

検索結果

• Article

  Application of proton beam writing for the direct etching of polytetrafluoroethylene for polydimethylsiloxane replica molding

  Nishikawa, H. & Hozumi, T., 2013 11月, In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 31, 6, 6F403.

  研究成果: Article › 査読

  • Proton beams 100%
  • Polydimethylsiloxane 77%
  • polytetrafluoroethylene 76%
  • Polytetrafluoroethylenes 70%
  • Etching 66%
  4 被引用数 (Scopus)

• Applications of Microstructures Fabricated by PBW to Electric-Micro Filters　(Invited)

  Nishikawa, H., Seki, Y., Furuta, Y., Uchiya, N., Nakata, T., Watanabe, T., Nakao, R., S.Uchida, S. U., Haga, J., Satoh, T., Ohkubo, T., Ishii, Y. & Kamiya, T., 2008 7月 24, In: Book of Abstracts, 11th International Conference on Nuclear Microprobe Technology and Applications (20-25 July, 2008, Debrecen, Hungary). p. 61

  研究成果: Article › 査読

• Applications of microstructures fabricated by proton beam writing to electric-micro filters

  Furuta, Y., Nishikawa, H., Satoh, T., Ishii, Y., Kamiya, T., Nakao, R. & Uchida, S., 2009 6月 15, In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 267, 12-13, p. 2285-2288 4 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • Escherichia coli 78%
  • yeast 74%
  • Yeast 73%
  • high aspect ratio 66%
  15 被引用数 (Scopus)

• Assembling gold nanoparticles by dielectrophoresis with pit arrays on PMMA fabricated by proton beam writing

  Shibuya, T., Uchida, S., Ishii, Y. & Nishikawa, H., 2019 10月 1, In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 456, p. 60-63 4 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • Gold nanoparticles 97%
  • Electrophoresis 80%
  • assembling 70%
  • proton beams 62%
  4 被引用数 (Scopus)

• Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser

  Miyake, Y., Nishikawa, H., Watanabe, E. & Ito, D., 1997 12月 11, In: Journal of Non-Crystalline Solids. 222, p. 266-271 6 p.

  研究成果: Article › 査読

  • Excimer lasers 100%
  • Fused silica 90%
  • Optical properties 80%
  • silica glass 73%
  • Excimer 70%
  14 被引用数 (Scopus)

• Characteristic red photoluminescence band in oxygen-deficient silica glass

  Sakurai, Y., Nagasawa, K., Nishikawa, H. & Ohki, Y., 1999 7月, In: Journal of Applied Physics. 86, 1, p. 370-373 4 p.

  研究成果: Article › 査読

  • silica glass 100%
  • photoluminescence 61%
  • oxygen 52%
  • dosage 28%
  • irradiation 28%
  40 被引用数 (Scopus)

• Characterization od ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica

  Nishikawa, H., Nakamura, R., Ohki, Y., Nagasawa, K. & Hama, Y., 1992 10月 1, In: The American Physical Society. 46, p. 8073-8079

  研究成果: Article › 査読

  15 被引用数 (Scopus)

• Characterization of ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica glass

  Nishikawa, H., Nakamura, R., Ohki, Y., Nagasawa, K. & Hama, Y., 1992 1月 1, In: Physical Review B. 46, 13, p. 8073-8079 7 p.

  研究成果: Article › 査読

  • silica glass 100%
  • electron paramagnetic resonance 79%
  • purity 75%
  • ultraviolet lasers 62%
  • chlorine 61%
  15 被引用数 (Scopus)

• Characterization of ion-implanted silica glass by vacuum 　ultraviolet absorption spectroscopy

  Hattori, M., Nishihara, Y., Ohki, Y., Fujimaki, M., Souno, T., Nishikawa, H., Yamaguchi, T., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2001 9月 3, In: Radiation Effects in Insulators, Paper No. P-H.3 (Lisbon, Portugal).

  研究成果: Article › 査読

• Characterization of ion-implanted silica glass by vacuum ultraviolet absorption spectroscopy

  Hattori, M., Nishihara, Y., Ohki, Y., Fujimaki, M., Souno, T., Nishikawa, H., Yamaguchi, T., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2002 5月, In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 191, 1-4, p. 362-365 4 p.

  研究成果: Article › 査読

  • Ultraviolet spectroscopy 100%
  • Absorption spectroscopy 86%
  • Fused silica 79%
  • ultraviolet absorption 72%
  • ultraviolet spectroscopy 69%
  10 被引用数 (Scopus)

• Controlling Spatial Curing Reactions of Epoxy Resin Systems on Ion Beam Writing

  Takano, K., Satoh, T., Koka, M., Kamiya, T., Ishii, Y., Ohkubo, T., Sugimoto, M., Nishikawa, H. & Seki, S., 2010 7月 1, In: 12th International Conference on Nuclear Microprobe Technology and Applications, Book of Abstracts. p. 173

  研究成果: Article › 査読

• Control of refractive index of fluorinated polyimide by proton beam irradiation

  Arai, Y., Ohki, Y., Saito, K. & Nishikawa, H., 2013 1月, In: Japanese Journal of Applied Physics. 52, 1, 012601.

  研究成果: Article › 査読

  • Proton beams 100%
  • Refractive index 80%
  • Polyimides 72%
  • polyimides 63%
  • Irradiation 63%
  3 被引用数 (Scopus)

• Correlation between the luminescence properties and the surface structures of submicron silica particles

  Inai, S., Harao, A. & Nishikawa, H., 2007 4月 1, In: Journal of Non-Crystalline Solids. 353, 5-7, p. 510-513 4 p.

  研究成果: Article › 査読

  • Photoluminescence 100%
  • Luminescence 90%
  • Surface structure 74%
  • Silica 63%
  • Annealing 61%
  8 被引用数 (Scopus)

• Correlation of preexisting diamagnetic defect centers with induced paramagnetic defect centers by ultraviolet or vacuum ultraviolet photons in high-purity silica glasses

  Nishikawa, H., Nakamura, R., Ohki, Y. & Hama, Y., 1993 12月 1, In: Physical Review B. 48, p. 15584-15594

  研究成果: Article › 査読

  55 被引用数 (Scopus)

• Correlation of preexisting diamagnetic defect centers with induced paramagnetic defect centers by ultraviolet or vacuum-ultraviolet photons in high-purity silica glasses

  Nishikawa, H., Nakamura, R., Ohki, Y. & Hama, Y., 1993 1月 1, In: Physical Review B. 48, 21, p. 15584-15594 11 p.

  研究成果: Article › 査読

  • silica glass 100%
  • purity 75%
  • vacuum 55%
  • photons 48%
  • defects 48%
  55 被引用数 (Scopus)

• Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography

  Takano, K., Kamiya, T., Sugimoto, M., Seki, S., Satoh, T., Ishii, Y., Ohkubo, T., Koka, M. & Nishikawa, H., 2010 6月 24, In: 27th International Conference of Photopolymer Science and Technology (ICPST-27).

  研究成果: Article › 査読

• Decay kinetics of the 4.4-eV photoluminescence associated with the two states of oxygen-deficient type defect in amorphous SiO2

  Nishikawa, H., Watanabe, E., Ito, D. & Ohki, Y., 1994 3月 1, In: Physical Review Letters. 72, p. 2101-2104

  研究成果: Article › 査読

  151 被引用数 (Scopus)

• Decay kinetics of the 4.4-eV photoluminescence associated with the two states of oxygen-deficient-type defect in amorphous SiO2

  Nishikawa, H., Watanabe, E., Ito, D. & Ohki, Y., 1994, In: Physical Review Letters. 72, 13, p. 2101-2104 4 p.

  研究成果: Article › 査読

  • photoluminescence 100%
  • oxygen 85%
  • kinetics 85%
  • decay 80%
  • defects 79%
  151 被引用数 (Scopus)

• Defects and optical absorption bands induced by surplus oxygen in high-purity synthetic silica

  Nishikawa, H., Tohmon, R., Ohki, Y., Nagasawa, K. & Hama, Y., 1989, In: Journal of Applied Physics. 65, 12, p. 4672-4678 7 p.

  研究成果: Article › 査読

  • purity 100%
  • optical absorption 99%
  • silicon dioxide 89%
  • absorption spectra 86%
  • linkages 78%
  131 被引用数 (Scopus)

• Defects in thermal oxide studied by photoluminescence spectroscopy

  Nishikawa, H., Stathis, J. H. & Cartier, E., 1999 8月 30, In: Applied Physics Letters. 75, 9, p. 1219-1221 3 p.

  研究成果: Article › 査読

  • photoluminescence 100%
  • oxides 88%
  • defects 79%
  • spectroscopy 74%
  • hydrogen 25%
  5 被引用数 (Scopus)

• Development of Dielectrophoretic Devices with High-Aspect Ratio Microstructures Using Proton Beam Writing

  Shiine, Y., Nishikawa, H., Furuta, Y., Sato, T., Ishii, Y., Kamiya, T., Nakao, R. & Uchida, S., 2009 9月 1, In: Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams (September 13-18, 2009).

  研究成果: Article › 査読

• Development of embedded Mach-Zehnder optical waveguide structures in polydimethylsiloxane thin films by proton beam writing

  Kada, W., Miura, K., Kato, H., Saruya, R., Kubota, A., Satoh, T., Koka, M., Ishii, Y., Kamiya, T., Nishikawa, H. & Hanaizumi, O., 2015, In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 348, p. 218-222 5 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • Optical waveguides 91%
  • Polydimethylsiloxane 77%
  • proton beams 62%
  • optical waveguides 60%
  7 被引用数 (Scopus)

• Development of micromachining technology in ion microbeam system at TIARA, JAEA

  Kamiya, T., Nishikawa, H., Satoh, T., Haga, J., Oikawa, M., Ishii, Y., Ohkubo, T., Uchiya, N. & Furuta, Y., 2009 3月, In: Applied Radiation and Isotopes. 67, 3, p. 488-491 4 p.

  研究成果: Article › 査読

  • microbeams 100%
  • micromachining 89%
  • nuclear energy 86%
  • Japan 82%
  • electroplating 48%
  4 被引用数 (Scopus)

• Dielectrophoretic devices fabricated by proton beam writing for concentration, assembly, and detection of nanoparticles

  Nishikawa, H., Kimura, T., Kawashima, R., Yamamoto, K., Uchida, S. & Ishii, Y., 2021, In: IEEJ Transactions on Fundamentals and Materials. 141, 10, p. 574-578 5 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • Electrophoresis 80%
  • Nanoparticles 60%
  • Polymers 33%
  • Silver nanoparticles 22%

• Effect of high-temperature treatment on optical-absorption bands in amorphous SiO₂

  Dohguchi, N., Munekuni, S., Nishikawa, H., Ohki, Y. & Nagasawa, K., 1991 12月 1, In: Journal of Applied Physics. 70, 5, p. 2788-2790 3 p.

  研究成果: Article › 査読

  • optical absorption 100%
  • absorption spectra 87%
  • oxygen 70%
  • molecules 37%
  • linkages 27%
  3 被引用数 (Scopus)

• Effect of high-temperature treatment on optical-absorption bands in amorphous SiO2

  Dohguchi, N., Munekuni, S., Nishikawa, H., Ohki, Y. & Nagasawa, K., 1991 9月 1, In: Journal of Applied Physics. 70, p. 2788-2790

  研究成果: Article › 査読

  3 被引用数 (Scopus)

• Effect of implanted ion species on the decay kinetics of 2.7 eV photoluminescence in thermal SiO₂ films

  Seol, K. S., Ohki, Y., Nishikawa, H., Takiyama, M. & Hama, Y., 1996 12月 1, In: Journal of Applied Physics. 80, 11, p. 6444-6447 4 p.

  研究成果: Article › 査読

  • photoluminescence 100%
  • kinetics 85%
  • decay 80%
  • ions 66%
  • silica glass 54%
  49 被引用数 (Scopus)

• Effect of implanted ion species on the decay of 2.7 eV photoluminescence in thermal

  Seol, K. S., Ohki, Y., Nishikawa, H., Takiyama, M. & Hama, Y., 1996 12月 1, In: Journal of Applied Physics. 80, p. 6444-6447

  研究成果: Article › 査読

• Effects of Ion Microbeam Irradiation on Silica Glass

  Nishikawa, H., Fukagawa, K., Yanagi, T., Ohki, Y., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2004 3月 1, In: Transactions of the Materials Research Society of Japan. 29, p. 603-606

  研究成果: Article › 査読

• Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma CVD method P2-27,pp.636-639 , June 5-9, 2005, Kitakyushu, Japan

  Hattori, T., Irisawa, E. & Nishikawa, H., 2005 6月 8, In: Proceedings of 2005 International Symposium on Electrical Insulating Materials,. p. 636-639

  研究成果: Article › 査読

• Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

  Tanabe, Y., Nishikawa, H., Seki, Y., Satoh, T., Ishii, Y., Kamiya, T., Watanabe, T. & Sekiguchi, A., 2011 8月, In: Microelectronic Engineering. 88, 8, p. 2145-2148 4 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • Electroforming 95%
  • electroforming 85%
  • Lithography 67%
  • high aspect ratio 66%
  14 被引用数 (Scopus)

• Electroforming of Ni mold using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

  Tanabe, Y., Nishikawa, H., Satoh, T., Ishii, Y., Kamiya, T., Watanabe, T. & Sekiguchi, A., 2010 9月 1, In: 36th International Conference on Micro & Nano Engineering (MNE),(Genoa, Italy, 19-22 September 2010).

  研究成果: Article › 査読

• Electron-beam irradiation effects on silica glass studied by cathodoluminescence

  Harada, T. & Nishikawa, H., 2006 6月 25, In: Book of Abstracts, pp. 118-119, 6th Symposium, SiO2 Advanced Dielectrics and Related Devices (Palermo, Italy), 25-28 June 2006.. p. 118-119

  研究成果: Article › 査読

  1 被引用数 (Scopus)

• Electronic circuit formation on flexible polymer surface processed by 1 MV accelerated hydrogen molecular ions

  Hayashi, H., Furukawa, W. & Nishikawa, H., 2019 11月 15, In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 459, p. 76-80 5 p.

  研究成果: Article › 査読

  • hydrogen ions 100%
  • molecular ions 97%
  • Ions 81%
  • Hydrogen 70%
  • Polymers 64%

• Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing

  Seki, Y., Furuta, Y., Nishikawa, H., Watanabe, T., Nakata, T., Satoh, T., Ishii, Y. & Kamiya, T., 2009 4月 1, In: Microelectronic Engineering. 86, 4-6, p. 945-948 4 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • Electroplating 75%
  • electroplating 74%
  • high aspect ratio 66%
  • proton beams 62%
  8 被引用数 (Scopus)

• Energy states of Ge-doped SiO2 glass estimated through absorption and photoluminescence

  Fujimaki, M., Ohki, Y. & Nishikawa, H., 1997 2月 1, In: Journal of Applied Physics. 81, p. 1042-1046

  研究成果: Article › 査読

  45 被引用数 (Scopus)

• Energy states of Ge-doped SiO₂ glass estimated through absorption and photoluminescence

  Fujimaki, M., Ohki, Y. & Nishikawa, H., 1997 2月 1, In: Journal of Applied Physics. 81, 3, p. 1042-1046 5 p.

  研究成果: Article › 査読

  • photoluminescence 100%
  • glass 82%
  • life (durability) 48%
  • ultraviolet absorption 45%
  • vacuum 44%
  45 被引用数 (Scopus)

• Enhanced photogeneration of E′ centers from neutral oxygen vacancies in the presence of hydrogen in high-purity silica glass

  Nishikawa, H., Nakamura, R., Ohki, Y. & Hama, Y., 1993 1月 1, In: Physical Review B. 48, 5, p. 2968-2973 6 p.

  研究成果: Article › 査読

  • silica glass 100%
  • purity 75%
  • silicon dioxide 66%
  • hydrogen 53%
  • oxygen 52%
  25 被引用数 (Scopus)

• Enhancing proton beam writing system with auto scanning software and stage movement

  Nguyen, T. P., Teshima, R., Hasegawa, T. & Nishikawa, H., 2013 2月, In: Microelectronic Engineering. 102, p. 12-17 6 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • proton beams 62%
  • Scanning 47%
  • computer programs 45%
  • Proton 40%
  1 被引用数 (Scopus)

• Enhaunced photogeneration of E' centers from neutral oxygen vacancies in the presence of hydrogen in high-purity silica glass

  Nishikawa, H., Nakamura, R., Ohki, Y. & Hama, Y., 1993 8月 1, In: Physical Review B. 48, p. 2968-2973

  研究成果: Article › 査読

  25 被引用数 (Scopus)

• Evaluation of Irradiation Effects on Silica Glass by Electron Beam

  Harada, T. & Nishikawa, H., 2005 4月 4, In: Book of Abstracts, 9th Spacecraft Charging Technology Conference. p. 107

  研究成果: Article › 査読

• Evaluation of microscopic structural randomness in SiO₂ by analysis of photoluminescence decay profiles

  Ishii, K., Seol, K. S., Ohki, Y. & Nishikawa, H., 1997, In: Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi). 119, 3, p. 1-6 6 p.

  研究成果: Article › 査読

  • Photoluminescence 100%
  • Exponential functions 75%
  • Ions 56%
  • Infrared absorption 49%
  • Oxygen vacancies 47%

• Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy

  Yamaguchi, T., Watanabe, E., Souno, T., Nishikawa, H., Hattori, M., Ohki, Y., Kamiya, T. & Arakawa, K., 2001 9月 3, In: Abstracts of Radiation Effects in Insulators.

  研究成果: Article › 査読

• Evaluation of silica glasses implanted by high-energy ions using a UV-excited microspectroscopy

  Yamaguchi, T., Watanabe, E., Souno, T., Nishikawa, H., Hattori, M., Ohki, Y., Kamiya, T. & Arakawa, K., 2002 5月, In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 191, 1-4, p. 371-374 4 p.

  研究成果: Article › 査読

  • Photoluminescence 100%
  • Fused silica 86%
  • silica glass 70%
  • Ions 56%
  • photoluminescence 43%

• Evaluation of the induced modification of a TiO₂/polydimethylsiloxane composite by proton beam

  Kaneko, Y., Hayashi, H. & Nishikawa, H., 2017, In: IEEJ Transactions on Fundamentals and Materials. 137, 11, p. 652-653 2 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • Polydimethylsiloxane 77%
  • Refractive index 40%
  • Composite materials 35%
  • TiO2 nanoparticles 29%

• Evaluation of Three Dimensional Microstructures on Silica Glass Fabricated by Ion Microbeam

  Nishikawa, H., Souno, T., Hattori, M., Nishihara, Y., Ohki, Y., Yamaguchi, T., Watanabe, E., Oikawa, M., Kamiya, T., Arakawa, K. & Fujimaki, M., 2001 10月 1, In: JAERI-Review 2001, TIARA Annual Report 2000. p. 235-237

  研究成果: Article › 査読

• Fabrication and evaluation of 3D-DEP devices utilized by proton beam writing

  Furuta, Y., Nishikawa, H., Satoh, T., Ishii, Y., Kamiya, T., Nakao, R. & Uchida, S., 2008 9月 1, In: 34th International Conference on Micro and Nano Engineering (15 -18 September 2008 Athens - Greece).

  研究成果: Article › 査読

• Fabrication and evaluation of 3D-electric micro filters using proton beam writing

  Furuta, Y., Nishikawa, H., Satoh, T., Ishii, Y., Kamiya, T., Nakao, R. & Uchida, S., 2009 4月 1, In: Microelectronic Engineering. 86, 4-6, p. 1396-1400 5 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • Dielectrophoresis 82%
  • Electrophoresis 80%
  • proton beams 62%
  • Fabrication 45%
  15 被引用数 (Scopus)

• Fabrication and Evaluation of Micrometer-scale Optical Elements using Three-dimensional Irradiation Effects Localized in Micro and Nano-scale Regions

  Nishikawa, H., Fukagawa, K., Yanagi, T., Nakamura, T., Ohki, Y., Watanabe, E., Oikawa, M., Arakawa, K. & Kamiya, T., 2004 10月 4, In: TIARA Annual Report 2003, JAERI-Review 2004-025. p. 234-236

  研究成果: Article › 査読

• Fabrication of 3-D Structures of Resist byProton Beam Writing

  Furuta, Y., Uchiya, N., Nishikawa, H., Haga, J., Satoh, T., Oikawa, M., Ishii, Y. & Kamiya, T., 2007 5月 29, In: The 51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (USA, May 29-June 1, 2007).

  研究成果: Article › 査読